3D Crossbar Nanowire Arrays for High-Density Memory

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Solution Overview

Problem

Current semiconductor fabrication technologies face challenges in miniaturization due to component size limits, precise alignment difficulties, increased defect probabilities, and quantum effects at molecular scales, making it impractical to manufacture densely packed nanoscale electronic circuits efficiently.

Innovation Solution

A three-dimensional crossbar array system comprising multiple layers of nanowires with demultiplexers to address and configure nanowire intersections, allowing for higher component density and reconfigurable electronic devices through programmable crossbar junctions with resistive elements.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If photolithographic methods are used to decrease component size, then component density increases, but manufacturing precision deteriorates due to alignment difficulties and quantum effects at molecular scales

Engineering Contradiction:
Improvecomponent densityVSAvoidalignment precision
Core Design Contradiction:
Quantity of substanceVSManufacturing precision

Solution Approach 1:

The patent transitions from two-dimensional planar photolithographic fabrication to three-dimensional nanowire crossbar structures. Multiple layers of nanowires are stacked vertically to form crossbar junctions, enabling higher component density while avoiding the alignment precision limitations of conventional photolithography at molecular scales

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Quantity of substance

If component size decreases below ultraviolet resolution limit, then component density increases, but manufacturing complexity increases due to requirement of higher-energy-radiation-based technologies

Engineering Contradiction:
Improvecomponent densityVSAvoidfabrication technology complexity
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent replaces complex higher-energy-radiation-based photolithographic systems with simpler nanowire assembly techniques. Instead of using expensive and complex equipment to fabricate sub-UV components, the invention uses nanowires that can be assembled into crossbar structures through less complex processes

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Quantity of substance

If component size decreases, then component density increases, but reliability decreases due to increased probability of defective devices from randomly distributed defects

Engineering Contradiction:
Improvecomponent densityVSAvoiddevice yield
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

By moving to three-dimensional crossbar structures with multiple nanowire layers, the patent increases the total volume available for components. This dimensional transition allows higher component density while maintaining reliability because defects are distributed throughout a larger three-dimensional space rather than being concentrated in two-dimensional planes

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS7763978B2Three-dimensional crossbar array systems and methods for writing information to and reading information stored in three-dimensional crossbar array junctions
Publication Date: 2010.07.27 HEWLETT PACKARD ENTERPRISE DEV LP
  • US7763978B2 patent drawing
  • US7763978B2 patent drawing
  • US7763978B2 patent drawing

AI summary

Various embodiments of the present invention are directed to three-dimensional crossbar arrays. In one aspect of the present invention, a three-dimensional crossbar array includes a plurality of crossbar arrays, a first demultiplexer, a second demultiplexer, and a third demultiplexer. Each crossbar array includes a first layer of nanowires, a second layer of nanowires overlaying the first layer of nanowires, and a third layer of nanowires overlaying the second layer of nanowires. The first demultiplexer is configured to address nanowires in the first layer of nanowires of each crossbar array, the second demultiplexer is configured to address nanowires in the second layer of nanowires of each crossbar array, and the third demultiplexer is configured to supply a signal to the nanowires in the third layer of nanowires of each crossbar array.