3D Glasses Compensation Films Phase Deviation

The patent extracts and removes the complicated chemical etching process from the fabrication sequence. Instead of using chemical etching to create optical filter patterns, the invention employs a simpler photolithography-based process where photoresist is coated, exposed through a mask, and developed to form the desired patterns. This extraction of the complex chemical etching step reduces fabrication process complexity while maintaining manufacturing precision for optical filter pattern formation.

The patent replaces mechanical removal methods (laser or grinder) with a chemical development process. After coating photoresist and exposing it through a mask, the invention uses a developer solution to chemically remove the exposed photoresist, forming the desired patterns. This substitution of mechanical/thermal methods with a chemical development process eliminates the risks of physical damage to the phase difference layer while achieving precise patterning through the mask-defined exposure areas.

The patent employs a mask that serves multiple functions: it defines both the optical filter patterns and ensures precise alignment with display panel pixels. The same mask used for photoresist exposure also determines the spatial relationship between optical filter patterns and pixels, enabling simultaneous achievement of manufacturing ease and precise pattern matching. This multi-functional mask approach eliminates the need for separate alignment processes while maintaining high image separation quality and reducing crosstalk.