3D Laser Lithography with Temporal Beam Demultiplexing
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Solution Overview
Problem
Existing laser lithography techniques for producing three-dimensional structures are time-consuming and often require close proximity of the focusing optics to the lithographic material, leading to potential contact and precision issues.
Innovation Solution
A method involving temporal demultiplexing of a laser beam to create multiple laser writing beams, which are then focused using an objective to rapidly produce three-dimensional structures within a lithographic material, thereby reducing the time required for structure creation without compromising precision.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single laser writing beam is used to create three-dimensional structures through sequential layer writing, then manufacturing precision is maintained, but productivity is reduced due to time-consuming sequential processing
Solution Approach 1:
The patent segments the single laser beam into multiple parallel writing beams using a demultiplexer unit. Each beam can independently write to different locations or layers simultaneously, transforming sequential single-beam writing into parallel multi-beam writing, thereby increasing productivity without sacrificing precision
Solution Approach 2:
The patent transitions from single-dimensional sequential writing to multi-dimensional parallel writing by spatially distributing multiple beams across different regions and layers of the lithographic material. This dimensional expansion allows simultaneous writing operations throughout the volume, dramatically reducing total creation time
2Manufacturing precision
If the focusing optics are positioned at low working distance (100 μm to 20 mm) to enable two-photon polymerization, then manufacturing precision is improved, but the risk of contact between the objective and lithographic material increases
Solution Approach 1:
The patent implements dynamic positioning and control of the focusing optics, allowing real-time adjustment of the working distance and objective position. This dynamic capability enables maintaining the optimal low working distance for precision while actively preventing contact through automated positioning control and feedback mechanisms
Solution Approach 2:
The system incorporates feedback control to monitor the position of the objective relative to the lithographic material. By continuously detecting position and adjusting accordingly, the system maintains the precise low working distance needed for two-photon polymerization while preventing contact that would compromise reliability
3Productivity
If multiple laser beams are created through demultiplexing to increase writing speed, then productivity is improved, but device complexity increases due to additional optical components
Solution Approach 1:
The demultiplexer unit is designed as a universal optical component that can generate multiple independent writing beams from a single laser source. This multi-functional device serves both as a beam splitter and a spatial distributor, enabling parallel writing operations while consolidating multiple functions into a single integrated unit, thereby managing complexity efficiently
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables rapid production of three-dimensional structures with maintained precision, as the demultiplexing process increases peak power of individual laser pulses, enhancing the efficiency of two-photon polymerization or multi-photon polymerization processes.
Implementation Method 1
forming a plurality of laser writing beams by demultiplexing the laser beam by means of a demultiplexer unit that is arranged between the laser beam source and an objective
Implementation Method 2
focusing the plurality of laser writing beams by means of the objective
Implementation Method 3
induced solidification only occurs upon absorption of two or more photons of the writing beam (two-photon polymerization or multi-photon polymerization)
Implementation Method 4
The lithographic material and the writing beam can be coordinated in such a way that induced solidification only occurs upon absorption of two or more photons of the writing beam
Data Source
AI summary
A method for creating a three-dimensional structure in a lithographic material (12), the method comprising the following steps: holding the lithographic material (12) by means of a lithographic material holder (14); generating an input laser beam (20) by means of a laser beam source (18); demultiplexing the input laser beam (20) for temporally splitting the input laser beam (20) in order to form a plurality of laser writing beams (26); focusing the plurality of laser writing beams (26) by means of an objective (70); creating the three-dimensional structure in the lithographic material (12) by means of the focused laser writing beams (26).