3D Shape Measuring Apparatus Selective Exposure Control
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Solution Overview
Problem
Existing three-dimensional shape measuring apparatuses face challenges in precision due to shot noise, especially when light intensity is low, leading to a decreased signal-to-noise ratio and increased power consumption or measurement time when adjusting exposure settings.
Innovation Solution
The apparatus sets a larger exposure amount for specific projection patterns used in triangulation to reduce shot noise and power consumption, while using other patterns with reduced exposure to minimize power usage and measurement time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If exposure amount is increased to reduce shot noise influence, then position detection precision is improved, but electric power consumption increases
Solution Approach 1:
The patent applies local quality by differentiating exposure amounts for different projection patterns. Specifically, patterns used for determining triangulation positions (first patterns) receive larger exposure amounts to reduce shot noise and improve precision, while other patterns (second patterns) use smaller exposure amounts to reduce power consumption. This localized optimization of exposure settings resolves the contradiction between precision and power consumption.
2Measurement precision
If exposure amount is increased to reduce shot noise influence, then position detection precision is improved, but measurement time increases
Solution Approach 1:
The patent applies local quality by differentiating exposure amounts for different projection patterns. Specifically, patterns used for determining triangulation positions (first patterns) receive larger exposure amounts to reduce shot noise and improve precision, while other patterns (second patterns) use smaller exposure amounts to reduce power consumption. This localized optimization of exposure settings resolves the contradiction between precision and power consumption.
3Measurement precision
If exposure amount is increased for all patterns, then position detection precision is improved, but power consumption increases
Solution Approach 1:
The patent applies local quality by differentiating exposure amounts for different projection patterns. Specifically, patterns used for determining triangulation positions (first patterns) receive larger exposure amounts to reduce shot noise and improve precision, while other patterns (second patterns) use smaller exposure amounts to reduce power consumption. This localized optimization of exposure settings resolves the contradiction between precision and power consumption.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances precision and reduces power consumption by selectively increasing exposure for patterns that determine position, while maintaining accuracy and shortening measurement time.
Implementation Method 1
projecting a plurality of pattern light beams from the projector apparatus onto the object to be measured
Implementation Method 2
When light enters a photodetection element such as a CCD image sensor used in an image capturing device, a signal according to a light intensity is obtained
Data Source
AI summary
An exposure amount of at least one or more first patterns used to determine positions at the time of triangulation is set to be larger than that of other patterns, so as to reduce the influence of shot noise in the first patterns, to improve precision, and to reduce power consumption as a whole. To this end, a three-dimensional shape measuring apparatus, which measures a three-dimensional shape of an object to be measured by projecting pattern light of a plurality of types of patterns onto the object to be measured, and capturing images of the object to be measured, controls a projector unit and image capture unit to set an exposure amount of the first patterns to be larger than that of patterns other than the first patterns.