3D NAND Cross-Point Source Connection for Lower ACS Resistance
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Solution Overview
Problem
As 3D NAND technology advances to higher layers, the resistance of the array common source (ACS) structures increases due to their growing height, leading to elevated resistance in the conductive channel and potential ground noise in sensing operations.
Innovation Solution
A cross-point structure is introduced where the source lines are electrically coupled to the n-well regions through direct VIA contacts, bypassing the conductive channel and reducing the resistance of the source lines to n-well regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the height of ACS structures is increased to accommodate higher memory density, then the storage capacity is improved, but the resistance of the conductive channel increases leading to ground noise
Solution Approach 1:
The conductive channel is segmented into multiple parallel paths by introducing additional ACS structures. Instead of relying on a single tall ACS structure with high resistance, the channel is divided into several shorter segments that are electrically parallel, reducing the overall resistance and preventing ground noise while maintaining the required storage capacity.
Solution Approach 2:
The solution transitions from a vertical dimension problem (tall ACS structures) to a horizontal dimension solution (multiple parallel ACS structures). By adding more ACS structures in the lateral direction rather than increasing the height of individual structures, the patent achieves lower resistance without increasing the vertical stack height, thus avoiding ground noise issues.
2Reliability
If the width of ACS regions is increased to reduce resistance, then the resistance is improved, but the die size increases due to high tungsten stress
Solution Approach 1:
Instead of widening a single ACS region, the conductive channel is segmented into multiple narrower parallel paths. Each individual ACS structure maintains a manageable width that avoids excessive tungsten stress, while the collective arrangement of multiple such structures achieves the required low resistance through parallel conduction paths.
Solution Approach 2:
The patent changes the geometric parameters of the ACS structures by reducing the height-to-width ratio. Instead of tall and narrow structures that require excessive width to reduce resistance, the solution uses multiple shorter and wider structures, fundamentally changing the dimensional parameters to achieve lower resistance without increasing die area.
Data Source
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AI summary
A semiconductor device is provided. The semiconductor device includes a first substrate that has a first side for forming memory cells and a second side that is opposite to the first side. The semiconductor device also includes a doped region and a first connection structure. The doped region is formed in the first side of the first substrate and is electrically coupled to at least a source terminal of a transistor (e.g., a source terminal of an end transistor of multiple transistors that are connected in series). The first connection structure is formed over the second side of the first substrate and coupled to the doped region through a first VIA. The first VIA extends from the second side of the first substrate to the doped region.