3D NOR Memory Stack Layout for Density Without Read-Speed Loss

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Solution Overview

Problem

The two-dimensional structure of NOR flash memory limits its cell density, making it less competitive with NAND flash in terms of storage capacity and read speed.

Innovation Solution

A three-dimensional semiconductor device is fabricated by stacking memory layers with connecting lines and insulating layers, forming a memory array with increased cell density and improved read speed, similar to NAND flash.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Speed

If NOR flash is formed as a two-dimensional structure, then read speed is improved, but cell density is limited

Engineering Contradiction:
Improveread speedVSAvoidcell density
Core Design Contradiction:
SpeedVSQuantity of substance

Solution Approach 1:

The patent transitions from a two-dimensional planar structure to a three-dimensional vertically-stacked structure. Multiple memory layers are stacked along a vertical direction, with each layer containing memory cells formed over respective substrates. This dimensional change enables significantly increased cell density while maintaining the parallel connection architecture that provides fast read speeds characteristic of NOR flash.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent implements a nested structure where multiple memory layers are stacked vertically, with each layer containing memory cells that are nested within the overall three-dimensional structure. The memory cells in different layers are interconnected through vertical connections, creating a nested arrangement that maximizes storage capacity within a given footprint while preserving NOR flash read performance.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Quantity of substance

If cell density is increased to compete with NAND flash, then storage capacity is improved, but read speed may deteriorate

Engineering Contradiction:
Improvecell densityVSAvoidread speed
Core Design Contradiction:
Quantity of substanceVSSpeed

Solution Approach 1:

By stacking memory layers vertically in the third dimension, the patent achieves high cell density without increasing the lateral footprint. The vertical stacking allows more memory cells to be packed into the same area while maintaining the parallel connection topology that enables fast read operations, thus avoiding the read speed deterioration that would normally accompany increased density.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent divides the memory structure into multiple discrete layers, each containing memory cells that can be independently formed and connected. This segmentation into stacked layers allows the memory array to be organized in a way that preserves the parallel connection architecture for fast reads while achieving high density through vertical arrangement of the segmented layers.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS11856779B2Semiconductor device, memory array and method of forming the same
Publication Date: 2023.12.26 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11856779B2 patent drawing
  • US11856779B2 patent drawing
  • US11856779B2 patent drawing

AI summary

A memory array includes a plurality of memory cells stacked up along a first direction. Each of the memory cells include a memory stack, connecting lines, and insulating layers. The memory stack includes a first dielectric layer, a channel layer disposed on the first dielectric layer, a charge trapping layer disposed on the channel layer, a second dielectric layer disposed on the charge trapping layer, and a gate layer disposed in between the channel layer and the second dielectric layer. The connecting lines are extending along the first direction and covering side surfaces of the memory stack. The insulating layers are extending along the first direction, wherein the insulating layers are located aside the connecting lines and covering the side surfaces of the memory stack.