3D Redistribution Trace Layout for Stacked-Die Signal Parity

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Solution Overview

Problem

Semiconductor devices face challenges in maintaining signal parity and timing due to varying trace paths caused by stacking semiconductor dies, leading to desynchronization of signals and processing delays.

Innovation Solution

Implementing three-dimensional trace length matching features, including traces that are neither parallel nor perpendicular to the longitudinal plane, with serpentine shapes and vertical segments, to equalize effective path lengths and ensure parity in signal arrival and processing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If multiple semiconductor dies are stacked vertically to reduce device volume, then the volume occupied by semiconductor devices is reduced, but varying trace paths cause signal timing parity to deteriorate

Engineering Contradiction:
Improvedevice volumeVSAvoidsignal timing parity
Core Design Contradiction:
Volume of moving objectVSReliability

Solution Approach 1:

The patent applies three-dimensional trace routing that extends beyond the traditional two-dimensional plane. Traces are configured to travel through multiple layers and vertical depths within the substrate, utilizing the Z-dimension to create equal-length paths. This dimensional expansion allows signal traces to compensate for path length differences caused by stacked die configurations, maintaining timing parity while preserving the compact vertical architecture.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If bonding sites and rerouting structures are tightly packed to increase capacity within limited area, then the capacity and performance of semiconductor devices are increased, but trace path variations cause signal synchronization to deteriorate

Engineering Contradiction:
Improvedevice capacityVSAvoidsignal synchronization
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The patent implements localized trace length matching features at specific critical paths within the redistribution layer. Rather than uniformly adjusting all traces, the design applies targeted serpentine patterns, via structures, and trace routing adjustments only where timing parity is needed. This localized approach maintains high device capacity through tight packing while correcting signal timing discrepancies only in affected regions.

Inventive Principle:
Principle #3Local quality

3Device complexity

If conventional two-dimensional trace routing is used in stacked semiconductor devices, then the device structure is simpler, but trace length matching precision deteriorates due to varying path lengths

Engineering Contradiction:
Improvetrace routing structureVSAvoidtrace length matching
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent transitions from two-dimensional to three-dimensional trace routing to achieve precise length matching. By utilizing vertical vias, multi-layer routing, and traces that extend through different depths of the substrate, the design creates equal-length signal paths that compensate for variations introduced by stacked die configurations. This three-dimensional approach provides the precision needed for trace length matching while maintaining manageable structural complexity through systematic routing patterns.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS20260026382A1Three dimensional semiconductor trace length matching and associated systems and methods
Publication Date: 2026.01.22 MICRON TECHNOLOGY INC
  • US20260026382A1 patent drawing
  • US20260026382A1 patent drawing
  • US20260026382A1 patent drawing

AI summary

Semiconductor devices with three-dimensional trace matching features, and related systems and methods, are disclosed herein. In some embodiments, an exemplary semiconductor device includes at least one semiconductor die and a redistribution layer disposed over the at least one semiconductor die and extending across a longitudinal plane. The redistribution layer includes first and second traces each electrically coupled to the at least one semiconductor die. The first trace is disposed in a first travel path included in a first effective path length. The second trace is disposed in a second travel path different from the first travel path. The second the second travel path includes at least one segment at a non-right, non-zero angle such that the at least one segment is neither parallel nor perpendicular to the longitudinal plane. Further, the second travel path is included in a second effective path length equal to the first path length.