3DIC Design Method Parallel Physical Feature Evaluation

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Solution Overview

Problem

The design of three-dimensional integrated circuits (3DICs) requires comprehensive Design-Technology Co-Optimization (DTCO) to optimize system-level performance, which is challenging due to the complexity of integrating multiple dies with various physical and electrical features.

Innovation Solution

A method is introduced that involves generating a technology file modeling to create a complete design model, incorporating evaluation operations such as IR/EM, PPA, thermal, and mechanical stress analysis to evaluate specification data, and iteratively adjusting the design parameters to meet preset criteria, allowing for parallel evaluation of multiple physical features.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If comprehensive Design-Technology Co-Optimization (DTCO) is performed to optimize system-level performance, then design quality and performance are improved, but design complexity and development time increase

Engineering Contradiction:
Improvesystem-level performanceVSAvoiddesign complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent divides the comprehensive DTCO process into separate evaluation operations, each targeting specific physical features (electrical, thermal, mechanical, etc.). This segmentation allows complex optimization to be managed through modular, independent analysis steps, reducing overall design complexity while maintaining system-level performance optimization.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent performs evaluation operations and parameter optimization before final manufacturing. By conducting preliminary analyses of electrical characteristics, thermal properties, mechanical stress, and other physical features in advance, the design can be optimized systematically, reducing complexity during later stages and ensuring performance requirements are met.

Inventive Principle:
Principle #10Preliminary action

2Measurement precision

If multiple evaluation operations are performed sequentially to ensure comprehensive optimization, then design accuracy is improved, but development time increases

Engineering Contradiction:
Improvedesign accuracyVSAvoiddevelopment time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent combines multiple evaluation operations (electrical, thermal, mechanical, etc.) into a unified evaluation framework that processes all physical features simultaneously. This merging approach allows comprehensive optimization to be achieved in parallel rather than sequentially, maintaining high design accuracy while reducing total development time.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent transitions from sequential, one-dimensional evaluation to multi-dimensional parallel evaluation. By organizing evaluation operations to run concurrently across different physical dimensions (electrical, thermal, mechanical), the system achieves comprehensive optimization without the time penalty of sequential processing.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Manufacturing precision

If iterative adjustment of design parameters is performed to meet preset criteria, then manufacturing quality is improved, but process complexity increases

Engineering Contradiction:
Improvedesign criteria complianceVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent implements a feedback mechanism where evaluation results are automatically compared against preset criteria, and design parameters are iteratively adjusted based on this feedback. This systematic feedback loop ensures manufacturing quality compliance while managing process complexity through automated, rule-based optimization rather than manual iteration.

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS20250165691A1Method of designing semiconductor device
Publication Date: 2025.05.22 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20250165691A1 patent drawing
  • US20250165691A1 patent drawing
  • US20250165691A1 patent drawing

AI summary

A method includes: generating first specification data of a semiconductor device; performing, to the first specification data, a first evaluation operation corresponding to a first physical feature to the first specification data, to generate first parameters; performing, to the first specification data, a second evaluation operation corresponding to a second physical feature different from the first physical feature, to generate second parameters; comparing the first parameters and the second parameters with preset parameters; and when the first parameters and the second parameters meet the preset parameters, manufacturing the semiconductor device according to the first specification data.