4-CPP Memory Structure Reducing Wordline RC

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Solution Overview

Problem

Current 2-port bitcells in modern circuitry face issues with increased metal resistance as device geometries scale, leading to higher wordline resistance-capacitance (RC) values, which slow down memory performance and result in unfavorable aspect-ratios and longer access times in system-on-chip (SoC) designs.

Innovation Solution

Implementing a 4-cell-poly-pitch (4-CPP) layout with L-shaped bitcells joined together, which widens the wordline width to reduce metal resistance and capacitance, improving the aspect-ratio and access time while maintaining low source voltage resistance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If 2-CPP bitcell layout is used, then area utilization is improved, but wordline resistance and capacitance increase

Engineering Contradiction:
Improvememory macro areaVSAvoidwordline resistance-capacitance
Core Design Contradiction:
Area of stationary objectVSObject-affected harmful factors

Solution Approach 1:

The patent transitions from traditional 2-CPP (two-cell poly pitch) layout to 4-CPP (four-cell poly pitch) layout, changing the dimensional organization of bitcells. This dimensional change allows wordlines to serve four bitcells instead of two, effectively reducing wordline RC without increasing area, as the bitcells are reorganized in a different spatial configuration

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Area of moving object

If device geometries are scaled to smaller nodes, then integration density is improved, but metal resistance increases exponentially

Engineering Contradiction:
Improvebitcell areaVSAvoidmetal resistance
Core Design Contradiction:
Area of moving objectVSObject-affected harmful factors

Solution Approach 1:

The patent merges the serving scope of wordlines by having a single wordline control four bitcells in the 4-CPP layout instead of the traditional two. This merging approach compensates for increased metal resistance at smaller nodes by reducing the total number of wordlines required, thereby reducing overall RC without sacrificing integration density

Inventive Principle:
Principle #5Merging (Combining)

3Ease of manufacture

If 2-CPP bitcell layout is used, then manufacturing simplicity is maintained, but access time increases

Engineering Contradiction:
Improvelayout manufacturingVSAvoidmemory access time
Core Design Contradiction:
Ease of manufactureVSLoss of time

Solution Approach 1:

The patent employs 4-CPP layout which reorganizes bitcells in a different dimensional arrangement, allowing shorter wordline lengths while maintaining manufacturing compatibility with standard CMOS processes. This dimensional reorganization reduces the distance signals must travel, thereby reducing access time without complicating manufacturing

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

4Object-affected harmful factors

If wordline length is reduced, then wordline resistance and capacitance decrease, but bitcell layout complexity increases

Engineering Contradiction:
Improvewordline RCVSAvoidbitcell layout structure
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The patent segments the memory array into blocks where each wordline serves a specific group of four bitcells in the 4-CPP configuration. This segmentation allows for shorter, more manageable wordline lengths while organizing bitcells in a systematic pattern that, while different from traditional layouts, follows regular design rules and does not excessively increase manufacturing complexity

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS10763267B2Memory structure with multi-cell poly pitch
Publication Date: 2020.09.01 ARM LTD
  • US10763267B2 patent drawing
  • US10763267B2 patent drawing
  • US10763267B2 patent drawing

AI summary

Various implementations described herein refer to an integrated circuit having a memory structure with a two-bitcell layout and a four cell poly pitch. The two-bitcell layout includes a first bitcell and a second bitcell with structural contours that are joined together in a coupling arrangement. The first bitcell and the second bitcell have multiple transistors that are arranged to store data during write operations and allow access of data during read operations.