AACVD Platinum Films Using Dithiocarbamate Precursors for DSSC Electrodes
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Solution Overview
Problem
Current methods for depositing platinum thin films, such as aerosol assisted chemical vapor deposition (AACVD), face challenges in achieving morphological stability and high catalytic activity due to agglomeration and radiation damage, and require appropriate precursors with low temperature decomposition profiles that are not adequately addressed by existing techniques.
Innovation Solution
The use of platinum dithiocarbamate compounds as aerosol precursors in AACVD for depositing platinum layers on substrates at elevated temperatures, with specific formulations and conditions to achieve high purity and controlled morphology, including the use of inert gases and organic solvents, to form coherent and conductive platinum films.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If magnetron sputtering or e-beam evaporation is used to deposit Pt films, then high purity platinum films can be obtained, but high vacuum and high power are required which increases cost and causes radiation damage to substrates
Solution Approach 1:
The patent replaces mechanical/physical vapor deposition methods (magnetron sputtering, e-beam evaporation) with chemical vapor deposition using aerosolized organoplatinum precursors. This substitution eliminates the need for high vacuum systems and high power inputs, as the deposition occurs through thermal decomposition of organic precursors at moderate temperatures (300-600°C) under ambient or near-ambient pressure conditions.
Solution Approach 2:
The patent changes the deposition parameters by using organoplatinum compounds with appropriate vapor pressures and thermal stabilities as precursors. These precursors decompose at moderate temperatures to deposit pure platinum films, avoiding the extreme vacuum and power conditions required by traditional physical vapor deposition methods.
2Ease of manufacture
If electrochemical deposition is used to deposit Pt films, then simplified processing can be achieved, but the resulting electrodes demonstrate inferior photovoltaic signals compared to CVD or pyrolysis electrodes
Solution Approach 1:
The patent modifies the deposition parameters by using aerosol-assisted chemical vapor deposition with organoplatinum precursors. This approach combines the simplicity of chemical deposition with the high quality of CVD films, achieving both ease of manufacture and superior photovoltaic performance through controlled thermal decomposition and film formation at moderate temperatures.
Solution Approach 2:
The patent uses composite organoplatinum precursor molecules that contain platinum metal centers coordinated with organic ligands. These composite precursors provide both the simplicity of solution-based processing and the high purity and performance of CVD films, as they decompose cleanly to deposit pure platinum without requiring complex vacuum equipment or electrochemical setups.
3Manufacturing precision
If conventional CVD is used to deposit Pt films, then thin films can be formed, but tuning of particle size, crystal structure, crystal orientation, porosity, and stress is necessary to improve performance which complicates the process
Solution Approach 1:
The patent changes the precursor chemistry to use organoplatinum compounds with specific molecular structures that decompose at moderate temperatures to form films with desirable properties. By selecting precursors with appropriate ligands and molecular geometries, the patent achieves control over film morphology and structure without requiring extensive tuning of deposition parameters such as particle size, crystal structure, and porosity.
Solution Approach 2:
The patent performs preliminary molecular design of the organoplatinum precursors, where the desired film properties are encoded in the precursor molecular structure. The organic ligands and molecular geometry are pre-configured to guide the decomposition and film formation processes, automatically producing films with controlled morphology and structure without requiring post-deposition tuning.
4Productivity
If AACVD is used to deposit Pt films at moderate temperatures, then industrial scalability is improved, but appropriate precursors with low temperature decomposition profiles and adequate vapor pressure must be found which is not adequately addressed by existing techniques
Solution Approach 1:
The patent changes the precursor parameters by using organoplatinum compounds with specific vapor pressures and thermal decomposition profiles. These precursors are designed to decompose at moderate temperatures (300-600°C) while maintaining adequate vapor pressure for effective aerosol delivery and film deposition, enabling industrial scalability without requiring extreme conditions or specialized precursor synthesis.
Solution Approach 2:
The patent uses organoplatinum compounds as intermediary substances that bridge the gap between the requirements for low temperature decomposition and adequate vapor pressure. These intermediary precursors can be delivered as aerosols at moderate temperatures, decompose cleanly to deposit pure platinum, and are available through standard chemical synthesis routes, making them suitable for industrial applications.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in platinum films with high elemental purity and improved catalytic performance, suitable for applications in dye-sensitized solar cells, with enhanced charge transport properties and stability, comparable or superior to commercial Pt-paste electrodes.
Implementation Method 1
heating the substrate to a deposition temperature above 150° C. in a reactor; and introducing, at the deposition temperature, into the reactor an aerosol comprising a platinum dithiocarbamate compound, salt, and/or solvate thereof, to thereby deposit the platinum layer on the substrate
Implementation Method 2
aerosol assisted chemical vapor deposition (AACVD)
Data Source
AI summary
Platinum films can be obtained by aerosol assisted chemical vapor deposition (AACVD) using one or more Pt-dialkyldithiocarbamate complexes of formula Pt(S2CNR2), wherein R is independently alkyl, aryl, or alkaryl, particularly as single source precursors. Such methods may include heating a substrate to a deposition temperature above 150° C. in a reactor; and introducing into the reactor, at the deposition temperature, an aerosol including a platinum dithiocarbamate compound, salt, and/or solvate thereof, to thereby deposit the platinum layer on the substrate. The Pt(S2CNR2)-derived films have well-connected and defect-free surface topography and better catalytic performance, likely due to their high conductivity and reflectivity.