ACC Beam Shaping With Cylindrical Lenses Under Space Constraints
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Solution Overview
Problem
Conventional Advanced Charge Controller (ACC) modules in electron beam systems face challenges in efficiently controlling charges on semiconductor wafers due to limited space between the e-beam column components and the wafer holder, leading to reduced beam efficiency and charge density.
Innovation Solution
The ACC module incorporates a lens system that manipulates the fan angles of the beam in both the tangential and sagittal planes to shape the projection spot on the wafer, ensuring sufficient charge density and luminous energy delivery while avoiding obstructions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the ACC module uses a conventional lens system configuration, then the structure is simple, but the beam efficiency and charge density are reduced due to limited space between e-beam column components and wafer holder
Solution Approach 1:
The patent applies dimensionality change by manipulating the beam in both tangential and sagittal planes independently. The lens system includes a first lens for controlling fan angle in the tangential plane and a second lens for controlling fan angle in the sagittal plane, transforming a conventional single-plane beam control into a two-dimensional beam shaping approach to overcome spatial constraints.
Solution Approach 2:
The patent changes physical parameters of the beam by independently adjusting the fan angle in tangential and sagittal directions. This parameter control allows optimization of beam shape and charge density without requiring physical reconfiguration of the entire lens system, thereby improving beam efficiency while maintaining manageable device complexity.
2Productivity
If the ACC module delivers sufficient charge density to the wafer, then the inspection efficiency improves, but the space constraint between e-beam column components and wafer holder limits the achievable charge density
Solution Approach 1:
The patent overcomes the limited space constraint by operating in two dimensional planes (tangential and sagittal) rather than relying solely on increasing beam current in a single direction. This allows the beam to be shaped to fit within the constrained space while still delivering sufficient charge density to the wafer surface for efficient inspection.
Solution Approach 2:
The patent applies local quality by independently controlling beam properties in different spatial regions through separate lens systems for tangential and sagittal planes. This allows optimization of charge density at the wafer surface location while maintaining appropriate beam dimensions to navigate the limited space between components.
3Adaptability or versatility
If the ACC module uses independent fan angle control in tangential and sagittal planes, then the beam shaping capability improves, but the lens system complexity increases
Solution Approach 1:
The patent segments the beam control function into two independent parts: a first lens system for controlling fan angle in the tangential plane and a second lens system for controlling fan angle in the sagittal plane. This segmentation allows each lens system to be optimized for its specific function, improving overall beam shaping capability while keeping individual subsystems manageable in complexity.
Solution Approach 2:
The lens system is designed with multi-functionality where the combination of first and second lenses provides both beam direction control and beam shape control. This universal design allows a single lens system configuration to achieve multiple objectives (beam positioning, fan angle control in two planes) without requiring additional separate components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the ACC module's performance by achieving higher luminous energy delivery and charge density on the wafer, thereby improving the efficiency of charge control and inspection processes in electron beam systems.
Implementation Method 1
a lens system configured to shape the emitted beam by manipulating a fan angle of the emitted beam in a tangential plane and a fan angle of the beam in a sagittal plane
Data Source
AI summary
A system and a method for manipulating a beam of an Advanced Charge Controller module in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens.