Acetal Organotin Compounds for EUV Patterning Stability
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Solution Overview
Problem
Existing organotin compounds for radiation-based patterning face challenges in achieving high process stability while maintaining photochemical sensitivity, as high activation energy tin-carbon bond chemistry often compromises sensitivity.
Innovation Solution
The development of organotin compounds with acetal functional groups, which enable new exposure mechanisms driven by photochemistry on the R group rather than radiolysis of the R—Sn bond, thereby expanding the photoresist design space.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If high activation energy tin-carbon bond chemistry is used to achieve high process stability, then process stability is improved, but photochemical sensitivity deteriorates
Solution Approach 1:
The patent introduces acetal functional groups into the organotin compound structure, which fundamentally changes the photochemical reaction pathway. Instead of relying on direct R-Sn bond radiolysis, the acetal group enables photochemical reactions at lower energies, thereby maintaining high process stability while restoring photochemical sensitivity
Solution Approach 2:
The patent creates composite organotin compounds that combine the stable tin-carbon bond framework with acetal functional groups. This composite structure allows the stable Sn-C bonds to provide process stability while the acetal groups provide the photochemical sensitivity needed for radiation-based patterning
2Reliability
If R-Sn bond radiolysis is used as the exposure mechanism, then photochemical sensitivity is improved, but process stability deteriorates
Solution Approach 1:
The acetal functional group acts as an intermediary that mediates between the stable R-Sn bond and the photochemical reaction. Upon irradiation, the acetal group undergoes photochemical transformation first, which then triggers or facilitates the desired patterning effect without requiring direct R-Sn bond cleavage, thus preserving process stability while achieving sensitivity
3Manufacturing precision
If conventional organotin compounds are used for positive tone patterning, then patterning is achieved, but process window is limited
Solution Approach 1:
By incorporating acetal functional groups, the patent changes the photochemical parameters of the organotin compounds, enabling them to respond to a broader range of radiation doses and processing conditions. This expands the process window while maintaining the required patterning resolution
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
These acetal-functional-group-containing organotin compounds achieve high stability and sensitivity, allowing for improved positive tone patterning with extended EUV dose process windows and enhanced thermal stability.
Implementation Method 1
new exposure mechanisms of RSn resists driven by photochemistry on the R group rather than radiolysis of the R—Sn bond
Data Source
AI summary
Organotin patterning compositions have radiation sensitive ligands with acetal functional groups. Precursor compositions are compositions comprising (OR4)(OR3)R2CR1SnL3, where the R groups are substituted or unsubstituted hydrocarbyl groups and L is a hydrolysable ligand. The precursors can be formed into coating that can be patterned with radiation, in particular EUV radiation. Coatings formed with blended precursors with hydrocarbyl-based ligands with some having acetal groups and others lacking acetal groups can be particularly effective for improving positive tone patterning.