Acetylenic Surfactants for Flowable Oxide Deposition
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Solution Overview
Problem
The flowable chemical vapor deposition (FCVD) process faces issues with incomplete wetting of substrates, leading to non-uniform coverage and incomplete filling of narrow lines, gaps, or vias, and a relatively slow deposition rate, as conventional alcohol-based surfactants are ineffective in these applications.
Innovation Solution
Incorporating acetylenic alcohols and diols as volatile surfactants into the film-forming compositions to enhance wetting and deposition rates, which can be premixed with other components or delivered separately as a vapor, mist, or aerosol, improving the filling of narrow features and film density.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional alcohol-based surfactants are used in FCVD process, then the process is simple and easy to implement, but substrate wetting is incomplete leading to non-uniform coverage and incomplete filling of narrow features
Solution Approach 1:
The patent changes the chemical parameters of the surfactant by transitioning from conventional alcohol-based surfactants to acetylenic alcohol-based surfactants. This parameter change fundamentally alters the wetting properties, enabling complete substrate coverage and proper filling of narrow features while maintaining process simplicity.
Solution Approach 2:
The invention uses composite surfactant formulations based on acetylenic alcohols that combine multiple functional properties (wetting, adhesion, and filling capabilities) into a single surfactant system, achieving superior performance compared to conventional single-component alcohol-based surfactants.
2Productivity
If conventional alcohol-based surfactants are used in FCVD process, then the formulation is simple, but deposition rate is slow
Solution Approach 1:
The patent changes the chemical composition parameter from conventional alcohols to acetylenic alcohols, which fundamentally improves the deposition rate. The acetylenic functional group provides enhanced reactivity and film formation kinetics, resulting in faster deposition while the formulation remains relatively simple.
3Reliability
If acetylenic alcohols and diols are used as surfactants, then substrate wetting and deposition rates are improved, but the formulation becomes more complex
Solution Approach 1:
The patent employs parameter changes by selecting specific acetylenic alcohols and diols with optimized molecular structures and concentrations. This allows achieving superior wetting and uniform coverage while controlling the formulation complexity through careful selection of surfactant types and ratios.
Solution Approach 2:
The acetylenic alcohol-based surfactants act as intermediary substances that mediate between the deposition process and the substrate surface. They provide the necessary wetting and adhesion properties to achieve uniform coverage, effectively bridging the gap between the simple FCVD process and the requirement for high-quality film formation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The use of acetylenic alcohols and diols as surfactants improves substrate wetting and deposition rates, resulting in more uniform and complete coverage of substrates, particularly in narrow features, and increases the deposition rate, addressing the limitations of traditional surfactants in FCVD processes.
Implementation Method 1
Incorporating acetylenic alcohols and diols as volatile surfactants into the film-forming compositions to enhance wetting
Implementation Method 2
improve substrate wetting and deposition rates
Implementation Method 3
the water within the mixture can react with the alkoxysilanes to hydrolyze the alkoxide and/or aryloxide groups and generate silanol species
Implementation Method 4
which further condense with other hydrolyzed molecules and form an oligomeric or network structure
Implementation Method 5
flowable chemical vapor deposition of silicon oxide
Data Source
AI summary
Described herein are compositions or formulations for forming a film in a semiconductor deposition process, such as without limitation, a flowable chemical vapor deposition of silicon oxide. Also described herein is a method to improve the surface wetting by incorporating an acetylenic alcohol or diol surfactant such as without limitation 3,5-dimethyl-1-hexyn-3-ol, 2,4,7,9-tetramethyl-5-decyn-4,7-diol, 4-ethyl-1-octyn-3-ol, and 2,5-dimethylhexan-2,5-diol, and other related compounds.