Low Vapor Pressure Acid Conditioner for Dental Enamel Infiltration

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing enamel lesion infiltration methods face challenges with synthetic resin penetration due to pseudo-intact surface layers with higher mineral content, and hydrochloric acid conditioning agents have storage stability and safety issues due to high vapor pressure and aggressiveness.

Innovation Solution

A kit containing a conditioner with 4-80% acid of pKa value 2 or less and a protic solvent, such as methanesulfonic acid or p-toluenesulfonic acid, with low saturation vapor pressure, which effectively etches enamel lesions without volatile acid escape, combined with a curable synthetic resin infiltrant for enhanced penetration.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If hydrochloric acid is used as a conditioning agent to effectively etch enamel lesions, then the etching efficacy is improved, but the storage stability deteriorates due to high vapor pressure causing acid escape

Engineering Contradiction:
Improveetching efficacyVSAvoidstorage stability
Core Design Contradiction:
Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The patent changes the chemical parameter of the acid from hydrochloric acid (high vapor pressure) to organic acids with low vapor pressure (≤120 mbar at 20°C), such as methanesulfonic acid or p-toluenesulfonic acid. This parameter change maintains etching efficacy while dramatically improving storage stability by preventing acid vapor escape.

Inventive Principle:
Principle #35Parameter changes

2Power

If concentrated hydrochloric acid is used to achieve sufficient etching, then the etching power is improved, but the safety deteriorates due to aggressive acid vapor damaging biological tissue

Engineering Contradiction:
Improveetching powerVSAvoidtissue damage from acid vapor
Core Design Contradiction:
PowerVSObject-affected harmful factors

Solution Approach 1:

The patent changes the acid type from hydrochloric acid to organic acids with low vapor pressure, maintaining sufficient etching power (pKa ≤ 2) while eliminating the harmful vapor phase. The low vapor pressure parameter ensures aggressive acid components do not escape during storage or use, preventing tissue damage.

Inventive Principle:
Principle #35Parameter changes

3Ease of operation

If the pseudo-intact surface layer is not pretreated, then the storage and handling is simpler, but the infiltrant penetration deteriorates due to the dense surface layer blocking resin penetration

Engineering Contradiction:
Improvehandling simplicityVSAvoidinfiltrant penetration
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The patent applies a preliminary etching action using the low-vapor-pressure acid conditioning agent to remove or modify the pseudo-intact surface layer before infiltrant application. This preliminary action creates a porous structure that enables subsequent infiltrant penetration, solving the contradiction between maintaining surface integrity and enabling resin infiltration.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The kit effectively erodes and penetrates pseudo-intact surface layers within manageable times, improving storage stability and safety by minimizing acid vaporization and ensuring complete penetration of the infiltrant, outperforming hydrochloric acid in etching efficacy and stability.

Implementation Method 1

The acids defined in more detail in the patent claim with a certain minimum acid strength value can effectively erode the remineralized surface layers of natural enamel lesions and thus prepare them for the penetration of an infiltrant.

Methodology Applied
Scientific EffectChemical etching: Chemical Bonding

Implementation Method 2

The low saturation vapor pressure provided according to the invention ensures that, unlike when using hydrochloric acid, aggressive acid components do not escape during storage or use of the composition according to the invention.

Methodology Applied
Scientific EffectVapor pressure equilibrium: Vapour Pressure

Data Source

PatentEP2108356B1Conditioning agent for the etching of enamel lesions
Publication Date: 2017.01.25 MUHLBAUER TECH
  • EP2108356B1 patent drawing

AI summary

Composition comprises 4-80 wt.% of at least an acid having pKa (acid dissociation constant)-value of = 2, and a protic solvent, where the acid exhibits a saturation vapor pressure of = 120 mbar at 20[deg] C. An independent claim is included for a kit to carry out the infiltration of dental enamel comprising a conditioner containing the composition, and an infiltrant.