Acid Diffusion Controlling Agent for Resist Composition
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Solution Overview
Problem
Conventional resist compositions face a trade-off between high sensitivity and roughness reduction, making it difficult to achieve both simultaneously, especially in the context of forming fine patterns with dimensions less than 100 nm for semiconductor and liquid crystal display elements.
Innovation Solution
A resist composition that generates an acid upon exposure, containing a base material component with acid-decomposable groups and an acid diffusion-controlling agent represented by a specific compound, allowing for controlled acid diffusion and improved lithography characteristics.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a photoreactive quencher with anion moiety is used as acid diffusion-controlling agent, then acid diffusion is controlled and lithography characteristics are improved, but sensitivity and roughness have trade-off relationship and cannot be achieved compatibly
Solution Approach 1:
The patent changes the chemical structure parameters of the acid diffusion-controlling agent by introducing specific cation types (alkali metal cations, alkaline earth metal cations, or ammonium ions) and controlling the ratio of anion to cation within specific ranges (0.5:1 to 5:1). This structural parameter optimization enables simultaneous achievement of high sensitivity and low roughness without the trade-off relationship present in conventional photoreactive quenchers.
Solution Approach 2:
The patent creates a composite acid diffusion-controlling agent comprising both cationic and anionic components with specific stoichiometric ratios. This composite structure combines the benefits of acid binding (cation) and acid generation (anion) in a single agent, enabling simultaneous optimization of sensitivity and roughness control that cannot be achieved with conventional single-function photoreactive quenchers.
2Quantity of substance
If conventional photoreactive quencher is used, then acid diffusion control is achieved, but high sensitivity and roughness reduction cannot be achieved simultaneously
Solution Approach 1:
The patent introduces a dual-functional acid diffusion-controlling agent that acts as an intermediary between acid generation and acid diffusion control. The anionic component serves as an acid generator while the cationic component controls acid diffusion, creating a mediating system that simultaneously improves sensitivity and reduces roughness without the trade-off relationship.
Solution Approach 2:
The acid diffusion-controlling agent is designed with multi-functionality: the anionic moiety generates acid to improve sensitivity, while the cationic moiety controls acid diffusion to reduce roughness. This single agent performs multiple functions that were previously requiring separate components, enabling simultaneous optimization of both sensitivity and roughness.
Data Source
AI summary
A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid. The resist composition includes a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (d0) in which Rd01 represents a monovalent organic group, Rd02 represents a single bond or a divalent linking group, m represents an integer of 1 or greater, and Mm+ represents an m-valent organic cation