Nitrogen-Containing Acid Diffusion Control Agents for Resist Rectangularity
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Solution Overview
Problem
Current acid diffusion control agents in radiation-sensitive resin compositions for microfabrication fail to achieve sufficient resolution, depth of focus, and line-width-roughness (LWR) performance, often resulting in top loss and irregular resist pattern shapes during the miniaturization of features.
Innovation Solution
Incorporation of specific nitrogen-containing compounds, such as those represented by formulas (1) and (2), which include hydrocarbon groups with alicyclic structures, heteroatom-containing groups, and aromatic hydrocarbon groups, to control acid diffusion and enhance the rectangularity of resist patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid diffusion control agents are used, then the resist pattern can be formed, but the resolution and depth of focus are insufficient
Solution Approach 1:
The patent changes the chemical structure parameters of the acid diffusion control agent by introducing specific nitrogen-containing groups (such as triazine, pyrimidine, and other heterocyclic structures) and controlling the molecular weight and functional group composition. These parameter changes optimize the acid diffusion control capability, thereby improving both resolution and depth of focus simultaneously
Solution Approach 2:
The patent employs composite acid diffusion control agents that combine multiple nitrogen-containing functional groups and heterocyclic structures in a single molecule or as a mixture of complementary molecules. This composite approach allows the agent to perform multiple functions: controlling acid diffusion, maintaining thermal stability, and providing adequate solubility, thus resolving the contradiction between resolution and depth of focus
2Manufacturing precision
If conventional acid diffusion control agents are used, then the resist pattern can be formed, but the line-width-roughness (LWR) performance is insufficient
Solution Approach 1:
The patent introduces acid diffusion control agents with specific local chemical structures (nitrogen-containing heterocyclic groups) that create localized zones of controlled acid diffusion. These local structural features ensure uniform acid distribution at the molecular level, thereby improving LWR performance and pattern uniformity without increasing overall device complexity
3Shape
If conventional acid diffusion control agents are used, then the resist pattern can be formed, but top loss occurs and rectangularity is poor
Solution Approach 1:
The patent incorporates acid diffusion control agents that preemptively control acid diffusion pathways before the development process begins. The nitrogen-containing heterocyclic structures in the agent create a pre-established diffusion barrier that prevents acid from reaching the top surface during subsequent processing, thereby preventing top loss and ensuring good rectangularity from the outset
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution enables the formation of resist patterns with improved resolution, depth of focus, and reduced LWR, while maintaining superior rectangularity and heat resistance, suitable for advanced microfabrication and semiconductor manufacturing.
Implementation Method 1
Upon irradiation with exposure light such as an ArF excimer laser beam or a KrF excimer laser beam, chemically amplified radiation-sensitive resin compositions generate an acid from an acid generating agent at a light-exposed site
Implementation Method 2
an acid diffusion control agent is incorporated in the radiation-sensitive resin composition for the purpose of appropriately controlling diffusion of the acid generated from the acid generating agent
Data Source
AI summary
An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group, or the like. R4 and R5 each independently represent a monovalent hydrocarbon group, or the like. R6 and R7 each independently represent a monovalent hydrocarbon group, or the like. R8 represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R9 represents a monovalent hydrocarbon group, or the like. R10 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R11 and R12 each independently represent a monovalent hydrocarbon group, or the like. R13 and R14 each independently represent a monovalent hydrocarbon group, or the like.