Radiation-Sensitive Composition for Acid Diffusion and Fine Pattern Control
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Solution Overview
Problem
Existing photolithography technologies face challenges in achieving high sensitivity, line width roughness (LWR), pattern rectangularity, development defect performance, exposure latitude (EL), critical dimension uniformity (CDU), and pattern circularity in the formation of fine resist patterns for semiconductor devices.
Innovation Solution
A radiation-sensitive composition comprising an onium salt compound, a polymer with an acid-dissociable group, and a solvent, which includes specific structural units and functional groups to enhance acid diffusion control and solubility, thereby improving resist film performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photolithography techniques are used, then existing process capabilities are maintained, but sensitivity, LWR, pattern rectangularity, development defect performance, EL, and CDU deteriorate for fine circuit formation
Solution Approach 1:
The patent changes the chemical parameters of the photoacid generator by using specific onium salt compounds with defined structural formulas (formula 1 and formula 2) containing particular organic groups W and linking groups L. This structural parameter change improves acid generation efficiency and diffusion control, thereby enhancing sensitivity, LWR, pattern rectangularity, development defect performance, EL, and CDU simultaneously
Solution Approach 2:
The patent creates a composite radiation-sensitive composition containing multiple components: onium salt compounds (formulas 1 and 2), polymers with acid-dissociable groups, and solvents. This composite formulation synergistically improves resist performance across multiple parameters including sensitivity, line width roughness, pattern rectangularity, development defect performance, exposure latitude, and critical dimension uniformity
2Manufacturing precision
If shorter wavelength radiation is used for finer pattern formation, then pattern resolution is improved, but process complexity and manufacturing difficulty increase
Solution Approach 1:
The patent changes the wavelength parameter of the radiation source to shorter wavelengths (extreme ultraviolet or X-ray range) to achieve finer pattern resolution. This is compensated by optimizing the photoacid generator structure (using onium salts with specific formulas) to maintain efficient acid generation at these shorter wavelengths, thereby improving resolution without proportionally increasing process complexity
3Reliability
If existing photoacid generators are used, then current process stability is maintained, but sensitivity and development defect performance deteriorate
Solution Approach 1:
The patent changes the chemical structure parameters of the photoacid generator by using onium salt compounds with specific formulas (1 and 2) containing defined organic groups W (3-40 carbon atoms with cyclic structures) and linking groups L ((r+1)-valent, r=1-3). This structural optimization improves acid generation efficiency and diffusion control while maintaining process stability, thereby enhancing sensitivity and reducing development defects
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves improved sensitivity, LWR, pattern rectangularity, development defect performance, EL, and CDU, resulting in high-quality resist patterns with reduced development defects.
Implementation Method 1
generating an acid by irradiating the coating of the resist composition with a radioactive ray through a mask pattern
Implementation Method 2
reacting in the presence of the acid as a catalyst to generate the difference of solubility of a resin into an alkaline or organic developer between an exposed part and a non-exposed part
Data Source
AI summary
A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit which includes an acid-dissociable group; and a solvent. In the formula (1), W is an organic group having 3 to 40 carbon atoms and having at least one cyclic structure; L is a (r+1)-valent linking group, and r is an integer of 1 to 3; when r is 1, p and q are each independently an integer of 1 to 3, and when r is 2 or 3, each of a plurality of p's and a plurality of q's are each independently an integer of 0 to 3, provided that when r is 2 or 3, at least one of a plurality of p's is 1 or more and at least one of a plurality of q's is 1 or more; M+ is a monovalent onium cation.