Acid Generator Structure for Resist Pattern Uniformity
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Solution Overview
Problem
Conventional acid generators used in chemically amplified resist compositions for lithography techniques, such as those disclosed in Patent Documents 3 to 5, still require improvement in lithography properties and resist pattern shape, particularly in terms of LWR, EL margin, and MEF.
Innovation Solution
A resist composition incorporating a base component that changes solubility in a developing solution under acid action and an acid-generator component represented by the general formula X-Q1-Y1—SO3⊖A⊕, where X is a cyclic group with an —SO2— or —O—SO2— bond, and Y1 is an alkylene or fluorinated alkylene group, generating acid upon exposure to form a resist pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid generators are used in chemically amplified resist compositions, then the resist composition can function for lithography, but the lithography properties and resist pattern shape require improvement
Solution Approach 1:
The patent modifies the chemical structure of the acid generator by introducing a specific cyclic group containing —SO2— or —O—SO2— bonds and oxygen-substituted carbon atoms. This structural parameter change enhances the acid generation efficiency and controls the solubility transition of the base resin, thereby improving lithography properties and pattern shape uniformity
Solution Approach 2:
The patent creates a composite resist composition system combining a specifically structured acid generator with a base resin containing carboxyl groups. This composite approach optimizes the interaction between acid generation and solubility change, achieving improved LWR, EL margin, and MEF values
2Adaptability or versatility
If the base resin exhibits increased solubility in alkali developing solution under acid action, then positive resist patterns can be formed, but the solubility in organic developing solution decreases
Solution Approach 1:
The patent introduces a base resin with specific local chemical groups (carboxyl groups) that respond differently to acid action in various developing solutions. This local quality modification enables the resin to exhibit increased solubility in alkali solutions while maintaining appropriate solubility characteristics in organic solutions, allowing flexible developing process selection
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The new resist composition exhibits enhanced lithography properties and improved resist pattern shape, addressing the limitations of previous acid generators by optimizing solubility changes and pattern formation in both alkali and solvent developing processes.
Implementation Method 1
an acid-generator component (B) which generates acid upon exposure
Data Source
AI summary
A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an —SO2— bond or an —O—SO2— bond, and at least one carbon atom which is not adjacent to the —SO2— bond or the —O—SO2— bond has an oxygen atom as a substituent; Q1 represents a divalent linking group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A+ represents an organic cation].[Chemical Formula 1]X-Q1-Y1—SO3⊖A⊕ (b1-1)