Acid-Labile Monomer for High-Resolution Resist Patterning
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Solution Overview
Problem
Current positive resist compositions face challenges in achieving high sensitivity and resolution while minimizing acid diffusion, which leads to edge roughness and pattern collapse during fine pattern formation in photolithography, especially at the 5-nm node and beyond.
Innovation Solution
A polymerizable monomer with a specific acid-labile group structure, represented by the general formula (1), is used to form a polymer compound that enhances solvent solubility and acidity, reducing acid diffusion and improving pattern contrast and edge roughness, thereby enabling high-resolution patterning with KrF or ArF excimer laser, electron beam, or EUV lithography.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If acid diffusion is minimized by decreasing temperature or PEB time, then resolution is improved, but sensitivity and contrast significantly decrease
Solution Approach 1:
The patent changes the chemical parameters of the acid-labile group from conventional tertiary ester types to a novel structure with specific substitution patterns (formula 1), achieving optimized acid elimination reactivity that resolves the sensitivity-resolution trade-off
Solution Approach 2:
The patent creates a composite acid-labile group structure combining specific aromatic substituents (formula 1) with the ester backbone, achieving synergistic effects that provide both high acid elimination reactivity and suppressed swelling behavior
2Manufacturing precision
If acid diffusion is suppressed by adding bulky acid generator, then resolution is improved, but edge roughness and pattern collapse increase
Solution Approach 1:
The patent optimizes the chemical structure parameters of the acid-labile group to achieve moderate acid elimination reactivity, preventing both excessive acid diffusion and harmful swelling effects that cause edge roughness and pattern collapse
Solution Approach 2:
The patent converts the potential harmful swelling behavior of carboxylic acid into a beneficial effect by designing the acid-labile group structure (formula 1) that eliminates acid with controlled reactivity, preventing pattern collapse while maintaining resolution
3Power
If conventional tertiary ester-type acid-labile group is used, then high acid elimination reactivity is achieved, but acid diffusion cannot be controlled and pattern collapse occurs
Solution Approach 1:
The patent introduces specific local structural features (formula 1) with particular substituents at defined positions, creating localized chemical environments that modulate acid elimination reactivity and suppress harmful swelling while maintaining high resolution
Solution Approach 2:
The patent systematically varies the chemical parameters of the acid-labile group structure (formula 1) including substituent types and positions to achieve optimal balance between acid elimination reactivity and suppression of acid diffusion
Data Source
AI summary
The present invention is a polymerizable monomer represented by the following general formula (1),wherein RA represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; ZL is a single bond or (backbone) —C(═O)—O—; RALU is an acid-labile group formed with an adjacent oxygen atom; XL represents an oxygen atom or a sulfur atom; Raa represents a hydrogen atom or a fluorine atom; R1a independently represents a hydrocarbyl group having 1 to 20 carbon atoms; n1 is an integer of 0 to 2; n2 is an integer of 1 or 2; n3 is an integer of 1 or 2; and n4 is an integer of 0 to 4.