Acid-Labile Resist Composition for Precise Plated Molded Articles
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Solution Overview
Problem
Conventional resist compositions used in plating treatments suffer from poor storage stability and accuracy in forming plated molded articles, with inadequate resistance to plating treatments and precision in resist pattern formation.
Innovation Solution
A resist composition comprising a resin with a specific acid-labile group, an alkali-soluble resin, an acid generator, and a compound represented by a specific formula, which enhances storage stability and plating resistance, allowing for high-precision resist pattern formation and accurate plated molded articles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conventional resist composition is used for plating treatment, then the resist pattern can be formed, but the storage stability is poor and the accuracy of plated molded articles is insufficient
Solution Approach 1:
The patent changes the chemical composition parameters of the resist composition by introducing a specific acid-labile group (formula 20) with particular structural characteristics (Ra1'-Ra3' groups forming heterocyclic rings), an acid generator (formula b0), and a compound (formula I). These parameter changes in molecular structure and composition directly improve both storage stability and plating treatment resistance, resolving the contradiction between reliability and manufacturing precision.
Solution Approach 2:
The patent creates a composite resist composition by combining multiple components: resin (A1) with specific acid-labile groups, alkali-soluble resin (A2), acid generator (B), and compound (C). This composite material approach allows each component to contribute specific properties, achieving both improved storage stability and high-precision plated molded article formation simultaneously.
2Reliability
If a conventional resist composition is used, then the resist pattern formation process can be completed, but the resistance to plating treatment is inadequate
Solution Approach 1:
The patent modifies the chemical parameters of the resist composition by incorporating a specific acid-labile group (formula 20) with defined structural features and an acid generator (formula b0). These parameter changes enhance the resist's resistance to plating treatment while maintaining high precision in resist pattern formation, as the modified chemical structure provides both protective properties and pattern fidelity.
Solution Approach 2:
The acid generator (B) acts as an intermediary that generates acid in situ during the plating treatment process. This intermediary mechanism allows the resist composition to selectively resist plating treatment through acid-generated modifications, maintaining pattern precision while providing adequate resistance without requiring the resist itself to be inherently resistant to plating chemicals.
3Reliability
If the resist composition is modified to improve storage stability, then the composition becomes more stable, but the complexity of the composition increases
Solution Approach 1:
The patent improves storage stability by changing specific chemical parameters - introducing a particular acid-labile group (formula 20) with specific structural features (Ra1'-Ra3' groups forming heterocyclic rings) and an acid generator (formula b0). These targeted parameter changes in molecular structure achieve improved stability without requiring complex multi-component systems or intricate formulations, thus resolving the contradiction between reliability and device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves improved storage stability, plating resistance, and high-precision resist pattern formation, resulting in uniform thickness and adherence to substrates, with enhanced accuracy in producing plated molded articles.
Implementation Method 1
an acid generator (B) including a compound represented by formula (b0)
Implementation Method 2
a resin (A1) including a structural unit having a prescribed acid-labile group (group represented by formula (20))
Implementation Method 3
an alkali-soluble resin (A2)
Data Source
AI summary
Disclosed are a resist composition comprising a resin (A1) including a structural unit having a group represented by formula (20), an alkali-soluble resin (A2), an acid generator (B) including a compound represented by formula (b0) and a compound (C) represented by formula (I), a method for producing a resist pattern using the resist composition, and a method for producing a plated molded article using the resist pattern:wherein, in formula (20), Ra1′ and Ra2′ each independently represent a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, Ra3′ represents a hydrocarbon group having 1 to 20 carbon atoms, X represents an oxygen atom, etc., na′ represents 0 or 1, and * represents a bond:wherein, in formula (b0), Rb1 represents a hydrocarbon group having 1 to 18 carbon atoms which may have a fluorine atom, X represents an oxygen atom, etc., R01 represents a hydrocarbon group having 1 to 18 carbon atoms, and x0 represents an integer of 1 to 6, and:wherein, in formula (I), ring W1 represents a heterocyclic ring having a nitrogen atom as atoms constituting the ring, etc., A1 represents a phenyl group, etc., and n represents 2 or 3.