Acoustic Imprint Lithography Template Actuation
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Solution Overview
Problem
Current imprint lithography techniques face limitations in resolution due to template deformation, high temperatures, and mechanical deformation of substrates, leading to pattern distortion and reduced throughput, especially when trying to achieve sub-100 nm features.
Innovation Solution
The implementation of a lithographic apparatus with a template holder, substrate table, radiation output, and detector to illuminate and monitor the interface between the imprint template and imprintable material, allowing for real-time detection of radiation scattering or reflection to ensure complete flow and minimize deformation, thereby improving resolution and efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If large forces are applied to push the template onto the substrate, then the imprinting process can be completed, but substrate and template deformation occurs leading to pattern damage
Solution Approach 1:
The patent replaces the conventional mechanical pushing system with an acoustic radiation pressure system. A acoustic wave generator applies acoustic radiation pressure to the template, eliminating the need for large mechanical forces. This substitution maintains template-substrate contact while preventing deformation and pattern damage, as acoustic pressure can be precisely controlled and distributed uniformly.
Solution Approach 2:
The patent changes the physical parameter used for template actuation from mechanical force to acoustic radiation pressure. By controlling the intensity and frequency of acoustic waves, the template can be pressed onto the substrate with precise pressure control, avoiding the deformation issues associated with conventional mechanical pushing while ensuring complete imprinting.
2Manufacturing precision
If considerable time is allowed for the imprintable material to flow into template recesses, then complete pattern transfer is achieved, but the process speed decreases making it slower than optical lithography
Solution Approach 1:
The patent replaces thermal heating with acoustic radiation pressure to drive the imprintable material flow. Acoustic waves create pressure gradients that actively push the material into template recesses much faster than thermal diffusion, achieving complete pattern transfer in significantly reduced time while maintaining high precision.
Solution Approach 2:
The patent employs periodic acoustic wave cycles to drive material flow into template recesses. The oscillating acoustic pressure creates repeated compression-expansion cycles that efficiently pump the imprintable material into the pattern features, dramatically accelerating the filling process compared to continuous thermal softening while ensuring complete infiltration.
3Productivity
If high temperatures are used to facilitate material flow, then the imprinting process can proceed, but template and substrate deformation increases
Solution Approach 1:
The patent substitutes thermal energy with acoustic radiation pressure to drive material flow. Acoustic waves directly mechanically push the imprintable material into template features without requiring thermal softening, thereby maintaining dimensional stability of the template and substrate while achieving complete pattern transfer.
Solution Approach 2:
The patent changes the physical mechanism driving material flow from thermal diffusion to acoustic radiation pressure. This parameter change allows the process to proceed at lower temperatures, preventing thermal deformation of the template and substrate while still achieving sufficient material flow for complete pattern transfer.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the resolution and speed of imprint lithography by reducing deformation and allowing for earlier template removal, thus improving the economic viability and accuracy of pattern transfer.
Implementation Method 1
detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate
Implementation Method 2
detect radiation reflected by the substrate
Data Source
AI summary
A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.