Acrylate-Based Photosensitive Composition for LCD Photolithography
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Solution Overview
Problem
The challenge in manufacturing large-area liquid crystal display diodes using glass substrates is the residual contamination after the developing process, which decreases productivity due to the need for increased developing solution flow rates, temperature, or process time, and existing methods to improve developing properties compromise pattern sensitivity and thickness stability.
Innovation Solution
An acrylate-based compound with organic acid groups and multiple acrylate groups centered on benzene, naphthalene, or anthracene structures is introduced, which improves developing properties without damaging photosensitivity, incorporated into a photosensitive composition including a binder resin, crosslinking compound, and photopolymerization initiator.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the developing solution flow rate, temperature, or process time is increased to remove residuals, then the developing property is improved, but the productivity decreases
Solution Approach 1:
The invention changes the chemical composition parameters of the photosensitive composition by incorporating specific compounds with carboxyl groups (such as carboxylic acid-modified polysiloxane and carboxylic acid-modified polyether) to improve developing properties without requiring changes in developing solution flow rate, temperature, or process time, thereby maintaining high productivity
2Reliability
If the acid value is increased or hardness of thin film is decreased to improve developing property, then the developing property is improved, but the pattern sensitivity and thickness stability are deteriorated
Solution Approach 1:
The invention uses a composite material system consisting of multiple components including carboxylic acid-modified polysiloxane, carboxylic acid-modified polyether, and other additives in specific ratios to achieve improved developing property while maintaining pattern sensitivity and thickness stability, avoiding the need to increase acid value or decrease film hardness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The acrylate-based compound shortens developing time in photolithography processes without affecting photosensitivity, enhancing productivity while maintaining pattern quality.
Implementation Method 1
a photopolymerization initiator
Data Source
AI summary
The present invention relates to an acrylate-based compound that includes an organic acid having two or more acrylate groups and one or more phenolic acid structures in one molecule, and a photosensitive composition including the same. It is possible to shorten a developing time in a photolithography process without damaging photosensitivity by using the photosensitive composition according to the present invention.