Actinic Ray-Sensitive Composition for High-Resolution Lithography
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Solution Overview
Problem
Current positive resists for electron beam lithography face a trade-off between sensitivity, resolution, and pattern profile, with existing solutions failing to simultaneously achieve high sensitivity, high resolution, and good exposure latitude, which is crucial for advanced semiconductor manufacturing.
Innovation Solution
An actinic ray-sensitive or radiation-sensitive composition comprising a compound with a phenolic hydroxyl group and a specific substituent structure, which enhances the resin's properties to achieve high resolution, high sensitivity, and good pattern profile, including exposure latitude, by incorporating a compound with a phenolic hydroxyl group and a group represented by a specific formula that allows for acid-decomposable protection and improved solubility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If elevation of sensitivity is sought for in positive resist for electron beam, then sensitivity is improved, but reduction of resolution is liable to occur
Solution Approach 1:
The patent changes the chemical parameters of the resist composition by introducing a phenolic hydroxyl group-containing compound with a specific substituent structure. This chemical modification enables the resist to achieve high sensitivity while maintaining high resolution, directly resolving the trade-off between sensitivity and resolution in electron beam lithography
Solution Approach 2:
The patent creates a composite resist system by combining the phenolic hydroxyl group-containing compound with other resist components. This composite approach allows the resist to simultaneously achieve high sensitivity, high resolution, and good exposure latitude, overcoming the limitations of single-component systems
2Reliability
If elevation of sensitivity is sought for in positive resist for electron beam, then sensitivity is improved, but good pattern profile is difficult to achieve
Solution Approach 1:
The patent modifies the chemical parameters of the resist by incorporating a compound with a phenolic hydroxyl group and a specific substituent structure. This chemical change enables the resist to achieve high sensitivity while maintaining good pattern profile, resolving the trade-off between sensitivity and pattern quality
3Manufacturing precision
If high resolution is achieved, then resolving power is improved, but sensitivity is reduced
Solution Approach 1:
The patent changes the chemical composition parameters by introducing a phenolic hydroxyl group-containing compound with a specific substituent structure. This modification enables the resist to achieve high resolution while maintaining high sensitivity, directly resolving the inverse relationship between resolution and sensitivity
4Reliability
If good exposure latitude is achieved, then pattern formation reliability is improved, but sensitivity and resolution trade-off remains
Solution Approach 1:
The patent develops a composite resist composition that integrates the phenolic hydroxyl group-containing compound with other resist components. This composite structure enables the simultaneous achievement of high sensitivity, high resolution, and good exposure latitude, overcoming the traditional trade-offs
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively balances high sensitivity, high resolution, and good pattern profile, reducing the dependency on exposure dose and enhancing the reliability of pattern formation, thereby addressing the limitations of existing technologies in semiconductor manufacturing.
Implementation Method 1
a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the following formula (1)... which enhances the resin's properties to achieve high resolution, high sensitivity, and good pattern profile, including exposure latitude, by incorporating a compound with a phenolic hydroxyl group and a group represented by a specific formula that allows for acid-decomposable protection and improved solubility
Data Source
AI summary
There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive or radiation-sensitive composition, a pattern forming method containing steps of exposing and developing the resist film, a manufacturing method of an electronic device, containing the pattern forming method, and an electronic device manufactured by the specific manufacturing method of an electronic device.