Actinic Ray-Sensitive Resin Composition for LER and Pattern Collapse
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Solution Overview
Problem
Existing actinic ray-sensitive or radiation-sensitive resin compositions used in microfabrication for semiconductor manufacturing suffer from deteriorated line edge roughness (LER) and pattern collapse issues during the formation of ultrafine patterns in submicron regions.
Innovation Solution
An actinic ray-sensitive or radiation-sensitive resin composition is developed, comprising a resin with increased polarity due to acid action and a compound that generates acid upon irradiation, featuring a repeating unit represented by General Formula (B-1), which includes electron-withdrawing groups and fluorine atoms, enhancing glass transition temperature and acid control within the resist film to improve LER performance and prevent pattern collapse.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional actinic ray-sensitive resin compositions are used for forming ultrafine patterns, then the basic lithography process can be performed, but the line edge roughness deteriorates and pattern collapse occurs easily
Solution Approach 1:
The patent changes the chemical parameters of the resin by introducing specific repeating units with electron-withdrawing groups (such as fluorinated groups) to modify the resin's polarity and glass transition temperature. This parameter change improves both LER performance and pattern collapse resistance by controlling acid diffusion and molecular mobility in the resist film.
Solution Approach 2:
The patent creates a composite resin system by combining multiple repeating units with different functions: some units provide polarity increase upon acid action, others provide high glass transition temperature through rigid structures and electron-withdrawing groups. This composite approach achieves both excellent LER performance and pattern collapse suppression.
2Length of moving object
If the exposure wavelength is shortened to achieve higher resolution patterns, then the pattern size decreases, but the LER deteriorates and pattern collapse increases
Solution Approach 1:
The patent adjusts the resin's glass transition temperature and polarity parameters to compensate for the increased LER associated with shorter exposure wavelengths. The electron-withdrawing groups and rigid structures in the repeating units maintain film stability at higher resolutions.
3Manufacturing precision
If the resin polarity increases by acid action to improve solubility contrast, then the pattern resolution improves, but the pattern collapse resistance decreases
Solution Approach 1:
The patent applies local quality by having different regions of the resist film exhibit different properties: the exposed regions undergo polarity increase for good solubility contrast and pattern definition, while the unexposed regions maintain higher glass transition temperature and molecular immobilization for pattern collapse resistance. The specific repeating units enable this spatial differentiation of functional properties.
Data Source
AI summary
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).