Actinic Ray-Sensitive Resin Composition for High Resolution
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Solution Overview
Problem
Current actinic ray-sensitive or radiation-sensitive resin compositions face challenges in achieving high resolution, particularly for miniaturized semiconductor elements, due to limitations in sensitivity and pattern formation with advanced exposure light sources like ArF excimer lasers and EUV light.
Innovation Solution
The development of an actinic ray-sensitive or radiation-sensitive resin composition that includes a resin with increased polarity through acid decomposition and a compound generating acid upon irradiation, featuring a repeating unit with two or more acid-decomposable groups and a phenolic hydroxyl group, optimized for high mass content and specific acid generation mechanisms.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resin compositions are used with advanced exposure light sources (ArF excimer laser, EUV light), then miniaturization of semiconductor elements is enabled, but resolution is insufficient due to limitations in sensitivity and pattern formation
Solution Approach 1:
The patent changes the chemical parameters of the resin by introducing specific repeating units with acid-decomposable groups (Formula A) and phenolic hydroxyl groups (Formula I). This modifies the resin's polarity and solubility characteristics, enabling better pattern formation and resolution with advanced exposure light sources while maintaining sensitivity
Solution Approach 2:
The patent creates a composite resin system by combining multiple types of repeating units (Formula A with acid-decomposable groups, Formula I with phenolic hydroxyl groups, and Formula B without specific functional groups) in defined ratios. This composite structure achieves both high resolution and reliable sensitivity/pattern formation that individual resin components cannot provide alone
2Manufacturing precision
If the resin includes repeating units with acid-decomposable groups and phenolic hydroxyl groups, then dissolution contrast between exposed and unexposed areas is improved, but device complexity increases
Solution Approach 1:
The patent applies local quality by assigning specific functional roles to different repeating units within the resin: Formula A units provide acid-decomposable groups for polarity change, Formula I units provide phenolic hydroxyl groups for solubility control, and Formula B units provide structural backbone. This localized functional distribution achieves high dissolution contrast while managing composition complexity through clear functional segmentation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This composition enhances resolution by improving dissolution contrast between exposed and unexposed areas, enabling better pattern formation and electronic device manufacturing with advanced light sources.
Implementation Method 1
a compound that generates an acid upon irradiation with actinic rays or radiation
Implementation Method 2
a resin of which polarity increases through decomposition by an action of an acid
Data Source
AI summary
An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition having an excellent resolution. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.The actinic ray-sensitive or radiation-sensitive resin composition of the embodiment of the present invention includes:a resin of which polarity increases through decomposition by the action of an acid; anda compound that generates an acid upon irradiation with actinic rays or radiation,in which the resin includes a resin including a repeating unit X1 having two or more groups of which polarity increases through decomposition by the action of an acid and a repeating unit X2 having a phenolic hydroxyl group.