Actinic Ray-Sensitive Resin Composition for Lithography

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Solution Overview

Problem

Conventional chemical amplification resist compositions fail to simultaneously improve line edge roughness, development defects, sensitivity, dissolution contrast, and pattern profile while reducing standing waves.

Innovation Solution

An actinic ray-sensitive or radiation-sensitive resin composition comprising a compound represented by formula (I), a resin that is alkali-insoluble or sparingly alkali-soluble but becomes easily alkali-soluble in the presence of an acid, and a compound capable of generating an acid upon irradiation, specifically a sulfonic acid, diazodisulfone, or sulfonium salt, along with specific repeating units in the resin.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional chemical amplification resist compositions are used, then basic pattern forming can be achieved, but line edge roughness and development defects are poor while sensitivity and dissolution contrast are insufficient

Engineering Contradiction:

Improveline edge roughnessVSAvoidsensitivity

Core Design Contradiction:

Manufacturing precisionVSReliability

Solution Approach 1:

The patent uses a composite resist composition containing a specific resin (component B) combined with a photoacid generator (component C) and a compound of formula (I). This composite approach allows simultaneous optimization of sensitivity, dissolution contrast, line edge roughness, and pattern profile by leveraging the synergistic effects of multiple components working together in the resist system.

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The patent modifies chemical parameters of the resist composition by introducing a resin with specific acid-sensitive groups that become alkali-soluble upon acid catalysis. This parameter change in the resin structure enables improved dissolution characteristics and pattern profile while maintaining high sensitivity through the photoacid generator system.

Inventive Principle:

Principle #35Parameter changes

2Manufacturing precision

If conventional resist compositions are used, then pattern formation is possible, but standing waves occur and pattern profile is poor

Engineering Contradiction:

Improvepattern profileVSAvoidstanding wave

Core Design Contradiction:

Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent converts the harmful standing wave effect into a beneficial outcome by using a resin composition that selectively dissolves in the exposed areas. The acid-generated solubility change creates a pattern where the harmful interference patterns are transformed into controlled dissolution regions, improving pattern profile and reducing standing wave artifacts.

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The patent changes the optical and chemical parameters of the resist system by using a resin with specific absorption characteristics and acid-sensitive groups. This parameter modification alters the interaction with incident radiation, reducing standing wave formation while improving pattern profile through controlled dissolution contrast.

Inventive Principle:

Principle #35Parameter changes

3Manufacturing precision

If conventional compositions are used, then basic resist function is achieved, but dissolution contrast and development defects are insufficient

Engineering Contradiction:

Improvedissolution contrastVSAvoiddevelopment defect

Core Design Contradiction:

Manufacturing precisionVSReliability

Solution Approach 1:

The patent introduces a resin with specific acid-sensitive functional groups that undergo parameter change upon acid catalysis, transforming from alkali-insoluble to alkali-soluble. This parameter change creates high dissolution contrast in exposed areas while the controlled nature of the reaction reduces development defects, achieving both improved dissolution contrast and reduced development defects simultaneously.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves high sensitivity, excellent dissolution contrast, improved pattern profile, reduced line edge roughness, and minimized development defects, while effectively suppressing standing waves.

Implementation Method 1

a compound capable of generating an acid upon irradiation with an actinic ray or radiation

Methodology Applied

Scientific EffectPhotoacid generation: Photopolymerisation

Implementation Method 2

a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid

Methodology Applied

Scientific EffectAcid-catalyzed solubility change: Catalysis

Data Source

PatentUS8741542B2Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same

Publication Date: 2014.06.03 FUJIFILM CORP

AI summary

Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.