Actinic Ray-Sensitive Resin Composition for High-Resolution Lithography

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Solution Overview

Problem

Current actinic ray-sensitive or radiation-sensitive resin compositions for ultramicrolithography struggle to achieve high sensitivity, high resolution, small line edge roughness, and excellent dry etching resistance simultaneously, while also maintaining temporal stability and minimizing scum formation.

Innovation Solution

A resin composition that includes a compound generating an acid with methylol groups as a cross-linking group through covalent bonding upon irradiation, combined with a phenolic hydroxyl group-containing compound and a cross-linking agent, to form a negative-tone pattern with improved hardenability and etching resistance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a positive-tone resist composition or negative-tone resist composition is used to increase sensitivity, then sensitivity is improved, but resolution deteriorates and line edge roughness increases

Engineering Contradiction:

ImprovesensitivityVSAvoidresolution

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The patent uses a composite material system consisting of a polymer compound with both acid-decomposable groups and cross-linkable groups, combined with a photo-acid generator. This composite approach allows the resist to exhibit both high sensitivity (through efficient acid generation) and high resolution (through controlled cross-linking that prevents line edge roughness), resolving the contradiction between sensitivity and resolution that plagues conventional single-function resist systems.

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The patent changes the chemical parameters of the resist system by introducing specific functional groups (acid-decomposable groups like lactone and cross-linkable groups like vinyl ether or oxetane) into the polymer backbone. This parameter change enables the resist to undergo controlled chemical transformations during exposure and development, achieving both high sensitivity and maintained resolution without the line edge roughness problems of conventional systems.

Inventive Principle:

Principle #35Parameter changes

2Strength

If cross-linking polymer compound with cross-linking agent is used to achieve negative-tone pattern, then pattern hardness is improved, but line edge roughness deteriorates

Engineering Contradiction:

Improvepattern hardnessVSAvoidline edge roughness

Core Design Contradiction:

StrengthVSManufacturing precision

Solution Approach 1:

The patent applies local quality by incorporating cross-linkable groups at specific positions within the polymer molecule (as side chains or backbone substituents) rather than using separate cross-linking agents. This localized incorporation ensures uniform cross-linking density throughout the resist film, creating hard patterns with smooth edges. The cross-linking occurs locally where the functional groups are positioned, preventing the aggregation and irregular cross-linking that causes line edge roughness in conventional systems.

Inventive Principle:

Principle #3Local quality

3Strength

If conventional photo-acid generator with cross-linking group is used, then cross-linking ability is improved, but temporal stability deteriorates causing scum formation

Engineering Contradiction:

Improvecross-linking abilityVSAvoidtemporal stability

Core Design Contradiction:

StrengthVSStability of the object's composition

Solution Approach 1:

The patent extracts the cross-linking function from separate cross-linking agents or pre-incorporated cross-linking groups in the photo-acid generator, and instead incorporates cross-linkable groups directly into the polymer compound structure. This separation ensures that the photo-acid generator remains chemically stable and temporally robust, while the polymer provides the cross-linking functionality only where and when needed upon acid generation, eliminating scum formation caused by premature or unstable cross-linking.

Inventive Principle:

Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves high sensitivity, high resolution, small line edge roughness, and excellent dry etching resistance, along with improved temporal stability and reduced scum formation, making it suitable for advanced photomask manufacturing.

Implementation Method 1

a compound which generates an acid by irradiation with actinic rays or radiation

Methodology Applied

Scientific EffectPhotolysis: Photodissociation

Implementation Method 2

the acid is linked with a group represented by the following general formula (M) through covalent bonding

Methodology Applied

Scientific EffectCross-linking: Chemical Bonding

Data Source

PatentUS9958775B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask

Publication Date: 2018.05.01 FUJIFILM CORP

AI summary

An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y1 and Y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)