Active Filtration System for Cleanroom Contamination Control

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current HEPA and ULPA filtration systems in cleanroom environments are inadequate for removing airborne molecular contamination (AMC) and biological particles, leading to potential contamination risks and inefficiencies in semiconductor and pharmaceutical manufacturing due to high pressure drops, incomplete removal of viruses, and biofilm formation in filters.

Innovation Solution

An active filtration system that combines electrostatic filtering with processes for inactivating or degrading molecular and biological contaminants, using a corona discharge to transform contaminants into less reactive or inert products, reducing particulate levels while minimizing energy consumption and pressure drop.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If HEPA or ULPA filtration systems are used to remove particulate contaminants, then particulate contamination levels are reduced, but pressure drop increases substantially

Engineering Contradiction:
Improveparticulate contamination levelVSAvoidpressure drop
Core Design Contradiction:
Manufacturing precisionVSStress or pressure

Solution Approach 1:

The patent replaces the mechanical filtration system (HEPA/ULPA filters) with an electrostatic precipitation system that uses electrical fields to charge and collect particles. This substitution eliminates the need for dense physical filter media, thereby maintaining effective particulate removal while substantially reducing pressure drop across the filtration system

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the operating parameters by introducing electrostatic charging mechanisms that allow particle collection at lower pressure drops. By controlling electrical field strength and charge distribution, the system achieves comparable particulate removal efficiency to HEPA/ULPA filters without requiring the same degree of mechanical resistance to airflow

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If HEPA or ULPA filtration systems are used to remove particulate contaminants, then particulate contamination levels are reduced, but airborne molecular contamination (AMC) removal is insufficient

Engineering Contradiction:
Improveparticulate contamination levelVSAvoidAMC removal effectiveness
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent merges electrostatic precipitation technology with chemical filtration capabilities into a single integrated system. The electrostatic section handles particulate removal while the chemical filtration section addresses AMC, allowing both functions to work synergistically rather than requiring separate systems

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent creates a multi-functional filtration system that simultaneously addresses both particulate contamination and airborne molecular contamination. The system performs multiple functions (electrostatic charging, particle collection, chemical adsorption) within a unified architecture, eliminating the need for separate HEPA/ULPA and chemical filter systems

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Reliability

If chemical filtration is added to remove airborne molecular contamination (AMC), then AMC levels are reduced, but pressure drop and cost increase

Engineering Contradiction:
ImproveAMC removal effectivenessVSAvoidpressure drop
Core Design Contradiction:
ReliabilityVSStress or pressure

Solution Approach 1:

The patent replaces traditional mechanical chemical filtration media with electrostatically charged collection mechanisms. By using electrical fields to attract and collect molecular contaminants rather than relying solely on physical adsorption through dense chemical filter media, the system achieves effective AMC removal with lower pressure drop

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

4Reliability

If conventional filtration and sterilization processes are used, then aseptic conditions are achieved, but aeration time required after sterilization is prolonged

Engineering Contradiction:
Improveaseptic conditionVSAvoidaeration time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent replaces conventional thermal or chemical sterilization processes with electrostatic precipitation and filtration. This substitution eliminates the need for prolonged aeration periods required to dissipate residual sterilants, as the electrostatic system physically removes contaminants without leaving harmful residues that require extended ventilation time

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The active filtration system effectively reduces AMC and biological contaminants, decreases aeration time after sterilization, and maintains sterile conditions, enhancing productivity and reducing contamination risks by efficiently decomposing gas-phase sterilants and molecular contaminants.

Implementation Method 1

using a corona discharge to transform contaminants into less reactive or inert products

Methodology Applied
Scientific EffectCorona discharge: Corona Discharge

Implementation Method 2

combines electrostatic filtering with processes for inactivating or degrading molecular and biological contaminants

Methodology Applied
Scientific EffectElectrostatic deposition: Electrostatic Deposition

Data Source

PatentUS9808760B2Active filtration system for controlling cleanroom environments
Publication Date: 2017.11.07 LG ELECTRONICS INC
  • US9808760B2 patent drawing
  • US9808760B2 patent drawing
  • US9808760B2 patent drawing

AI summary

This invention is in the field of systems and methods for controlling contamination in high purity environments. This invention relates generally to particulate filtering and treatment of molecular contamination and process gases in enclosures, such as cleanrooms, contamination controlled manufacturing environments, mini-environments, isolators, glove boxes and restricted air barrier systems (RABS). The invention is capable of chemically transforming molecular contamination and process gases into less reactive or inert reaction products while at the same time decreasing the level of biological and nonbiological particulates.