Semiconductor Active Region Doping for Low-Current Quantum Efficiency

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Solution Overview

Problem

Current semiconductor light-emitting devices face challenges in achieving high quantum efficiency, particularly at low current densities and in miniaturized forms, due to limitations in dopant distribution and aluminum content in barrier and well layers.

Innovation Solution

The semiconductor device incorporates a specific dopant distribution and varying aluminum content in barrier and well layers, with a higher dopant concentration in the first semiconductor structure compared to the active region, and a reflective layer to enhance quantum efficiency and light emission.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If uniform dopant distribution is used in semiconductor structures, then manufacturing simplicity is maintained, but quantum efficiency at low current densities deteriorates

Engineering Contradiction:
Improvedopant distribution uniformityVSAvoidquantum efficiency
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent applies local quality by implementing non-uniform dopant distribution where the first dopant concentration in the first semiconductor structure is intentionally higher than in the active region. This localized variation in dopant concentration optimizes quantum efficiency at low current densities while maintaining manufacturing feasibility through controlled gradient doping profiles.

Inventive Principle:
Principle #3Local quality

2Area of moving object

If device size is reduced for miniaturization, then integration density is improved, but quantum efficiency deteriorates

Engineering Contradiction:
Improvedevice areaVSAvoidquantum efficiency
Core Design Contradiction:
Area of moving objectVSReliability

Solution Approach 1:

The patent applies parameter changes by modifying the dopant concentration parameter in the first semiconductor structure. By increasing the first dopant concentration above that of the active region, the device achieves enhanced quantum efficiency at low current densities that compensates for size reduction effects, allowing miniaturization without proportional loss in performance.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration improves internal and external quantum efficiency, especially at low current densities and in miniaturized devices, leading to enhanced light-emitting power and stability across different temperatures.

Implementation Method 1

The first semiconductor structure includes a first dopant. The second semiconductor structure is located on the first semiconductor structure and includes a second dopant different from the first dopant.

Methodology Applied
Scientific EffectDoping: Dopants

Implementation Method 2

The active region includes a plurality of semiconductor pairs and located between the first semiconductor structure and the second semiconductor structure.

Methodology Applied
Scientific EffectElectroluminescence: Electroluminescence

Data Source

PatentUS12051767B2Semiconductor device and semiconductor component including the same preliminary class
Publication Date: 2024.07.30 EPISTAR CORP
  • US12051767B2 patent drawing
  • US12051767B2 patent drawing
  • US12051767B2 patent drawing

AI summary

A semiconductor device is provided, which includes a first semiconductor structure, a second semiconductor structure, and an active region. The first semiconductor structure includes a first dopant. The second semiconductor structure is located on the first semiconductor structure and includes a second dopant different from the first dopant. The active region includes a plurality of semiconductor pairs and located between the first semiconductor structure and the second semiconductor structure. Each semiconductor pair includes a barrier layer and a well layer and includes the first dopant. The active region does not include a nitrogen element. A doping concentration of the first dopant in the first semiconductor structure is higher than a doping concentration of the first dopant in the active region.