Active Showerhead MEMS Valves Gas Exchange Time
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Solution Overview
Problem
Current gas delivery systems in semiconductor processing are slow and expensive due to large numbers of individual components, leading to long gas exchange times and potential metal contamination, and require complex processing with many components.
Innovation Solution
An active showerhead with integrated micro-electromechanical systems (MEMS) valves and sensors for direct gas injection into the plasma reactor, eliminating the need for a gas box and mixing manifold, allowing for quick gas exchange and precise control of multiple gas species across a wafer surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If a traditional gas delivery system with gas box, mixing manifold, and multiple components is used, then gas flow control is achieved, but gas exchange time is long and system complexity increases
Solution Approach 1:
The patent removes the gas box and mixing manifold from the system, eliminating large volumes of piping and intermediate components. Gas is delivered directly from the showerhead nozzles to the substrate, extracting out the unnecessary intermediate gas delivery components that were causing long exchange times and system complexity
Solution Approach 2:
The patent integrates the gas delivery function directly into the showerhead assembly, combining what were previously separate components (gas box, mixing manifold, showerhead) into a single integrated unit. This merging eliminates the need for multiple discrete components and reduces the overall system complexity
2Object-affected harmful factors
If multiple OEM components and micro fittings are used in gas delivery system, then gas distribution is achieved, but metal contamination risk increases
Solution Approach 1:
The patent eliminates metal fittings, flanges, and intermediate connection components from the gas delivery path. By removing these potential contamination sources and using a direct-delivery design, the system minimizes the risk of metal contamination to the substrate
Solution Approach 2:
The patent applies different material properties to different parts of the system, using materials that are resistant to metal contamination in the gas delivery path while maintaining the structural integrity and functionality of the showerhead assembly
3Productivity
If gas mixing manifold and splitter are used, then gas mix is achieved, but processing time increases
Solution Approach 1:
The patent removes the gas mixing manifold and splitter components from the system. Gas mixing and distribution is achieved directly through the showerhead nozzles, eliminating the time required for gas to travel through and mix in intermediate components
Solution Approach 2:
The patent pre-mixes the gas components and delivers them directly through the showerhead nozzles before they reach the substrate. This preliminary gas preparation and direct delivery approach eliminates the need for in-situ mixing and reduces overall processing time
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution reduces processing time, increases reliability, and decreases costs by minimizing the number of components, enabling faster process sequencing and improved chamber packaging with precise gas distribution control.
Implementation Method 1
an actuator and transfer component coupled to the actuator control. The actuator and transfer component is coupled to the gas line via a gas channel
Data Source
Figure 1A
Figure 1B
Figure 1C
AI summary
An active showerhead used for a plasma reactor is described. The active showerhead includes a plurality of substrate layers. The substrate layers include at least one actuator and transfer component. The actuator and transfer component is coupled to a gas line via a gas channel. The active showerhead further includes an electrode layer located below the substrate layers. The electrode layer and the actuator and transfer component both share an opening. The actuator and transfer component allows passage of one or more process gases received from the gas line and the gas channel into the opening without the need for a conventional gas box.