Active Thermal Interposer for Individual Die Temperature Control

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Solution Overview

Problem

Current methods for environmental testing of integrated circuits, particularly at the wafer level, face challenges in precise heating and cooling of individual dies within a wafer, limiting the ability to perform effective wafer-level testing under environmental conditions.

Innovation Solution

The development of wafer scale active thermal interposer devices that include a thermal interposer layer with discretely controllable thermal zones and a cold plate for cooling, allowing for selective heating and temperature control of different areas of the wafer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional environmental chambers are used for testing integrated circuits, then the devices can be tested under controlled environmental conditions, but the testing rate is limited due to the large volume of air and mass of mounting structures required within the chamber

Engineering Contradiction:
Improveenvironmental testing capabilityVSAvoidtesting rate
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent divides the wafer into multiple discrete testable units (individual dies) that can be tested simultaneously or sequentially, eliminating the need for a single large environmental chamber. Each die can be independently thermal-controlled, allowing parallel testing operations and significantly increasing throughput.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces a wafer-level thermal control system with heating elements and cold plates as intermediary devices between the test equipment and the dies. This allows environmental conditions to be applied directly to the wafer without requiring a large environmental chamber, enabling rapid temperature changes and high-speed testing.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If chamber-less test systems are used to overcome environmental chamber limitations, then testing speed improves, but precise cooling of individual dies within a wafer becomes difficult

Engineering Contradiction:
Improvetesting speedVSAvoidindividual die cooling precision
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The thermal control system is segmented into discrete heating zones corresponding to individual dies or groups of dies on the wafer. Each zone can be independently controlled, allowing precise thermal management of individual dies while maintaining high testing speed in a chamber-less environment.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent applies local thermal control by positioning heating elements and cold plates to provide differentiated thermal conditions to different regions of the wafer. This enables precise cooling or heating of specific dies according to their individual testing requirements, achieving both speed and precision.

Inventive Principle:
Principle #3Local quality

3Productivity

If wafer-level testing is implemented to increase manufacturing throughput, then testing efficiency improves, but precise temperature control of individual dies becomes unavailable under conventional art

Engineering Contradiction:
Improvemanufacturing throughputVSAvoidindividual die temperature control
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The wafer is divided into multiple independently controllable thermal zones, each corresponding to one or more individual dies. This segmentation enables simultaneous wafer-level processing for high throughput while maintaining the ability to precisely control the temperature of each individual die according to its specific testing requirements.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The thermal control system is made dynamic and adaptive, allowing real-time adjustment of temperature for each die based on testing requirements. The system can rapidly change thermal conditions across different wafer regions, enabling both high throughput and precise individual die control that adapts to varying test conditions.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables precise temperature control of individual dies or groups of dies within a wafer, facilitating efficient wafer-level testing and identifying defective or sub-standard dies, thereby improving manufacturing throughput and reducing testing costs.

Implementation Method 1

a heating element layer (250) comprising a plurality of discrete and separately controllable heating elements configured to selectively heat different regions of a wafer (120)

Methodology Applied
Scientific EffectJoule heating: Joule Heating

Implementation Method 2

A cooling fluid, e.g., comprising glycol, is circulated through a portion of the cooling structure

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Implementation Method 3

A cooling fluid, e.g., comprising glycol, is circulated through a portion of the cooling structure

Methodology Applied
Scientific EffectConvection: Convection

Data Source

PatentUS12320841B2Wafer scale active thermal interposer for device testing
Publication Date: 2025.06.03 ADVANTEST TEST SOLUTIONS INC
  • US12320841B2 patent drawing
  • US12320841B2 patent drawing
  • US12320841B2 patent drawing

AI summary

A system for testing circuits of an integrated circuit semiconductor wafer includes a tester system for generating signals for input to the circuits and for processing output signals from the circuits for testing the wafer and a test stack coupled to the tester system. The test stack includes a wafer probe for contacting a first surface of the wafer and for probing individual circuits of the circuits of the wafer, a wafer thermal interposer (TI) layer operable to contact a second surface of the wafer and operable to selectively heat areas of the wafer, and a cold plate disposed under the wafer TI layer and operable to cool the wafer. The system further includes a thermal controller for selectively heating and maintaining temperatures of the areas of the wafer by controlling cooling of the cold plate and by controlling selective heating of the wafer TI layer.