Actuator Capacitance Measurement via Mechanical Coupling

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Solution Overview

Problem

In projection exposure apparatuses for semiconductor lithography, especially those using EUV and DUV systems, there is a lack of effective sensors to determine the topography of optically active surfaces due to limited installation space, leading to undetectable changes in actuator relationships and potential defects, which are difficult to diagnose using existing methods like impedance spectroscopy.

Innovation Solution

A method involving mechanically coupled piezoelectric or electrostrictive actuators, where one actuator is driven with a constant control signal, causing deflection in another, allowing capacitance changes to be measured, enabling conclusions about the mechanical coupling and integrity of the actuators, and potentially identifying defects by comparing capacitance values.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If no sensors are installed on the actuators due to limited installation space, then the device complexity is reduced, but the measurement precision and reliability of actuator monitoring deteriorates

Engineering Contradiction:
Improvesensor installationVSAvoidactuator topography measurement
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent uses a capacitor as an intermediary element to indirectly measure actuator deflection. Instead of directly measuring the actuator surface topography with sensors, the capacitor's capacitance changes in response to actuator deflection, providing an indirect but accurate measurement method that avoids installation space constraints

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent replaces direct mechanical/optical sensing systems with an electrical capacitance measurement system. By measuring the electrical property (capacitance) that changes with mechanical deflection, the system achieves measurement without requiring physical sensors on the actuator surface

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Device complexity

If actuators are driven in an open control loop without sensors, then the device complexity is reduced, but the reliability of detecting actuator defects and relationship changes deteriorates

Engineering Contradiction:
Improvecontrol systemVSAvoidactuator defect detection
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent implements a feedback mechanism by continuously monitoring capacitance changes of the actuator. This capacitance information provides feedback about the actuator's actual state, enabling detection of defects and relationship changes while maintaining relatively simple control system architecture

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The actuator itself serves its own measurement function through its capacitive properties. The actuator's electrical characteristics inherently provide information about its mechanical state, eliminating the need for separate dedicated sensing systems

Inventive Principle:
Principle #25Self-service

3Measurement precision

If impedance spectroscopy is used to measure actuators, then the measurement precision is improved, but the ease of manufacture and device complexity worsens due to high cost and technical difficulty

Engineering Contradiction:
Improveactuator measurementVSAvoidmeasurement system implementation
Core Design Contradiction:
Measurement precisionVSEase of manufacture

Solution Approach 1:

The patent employs a simple, inexpensive capacitor-based measurement approach instead of complex impedance spectroscopy equipment. The capacitance measurement system is much easier to manufacture and implement, providing adequate measurement precision without the high costs and technical complexities of impedance spectroscopy

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The patent measures a different electrical parameter (capacitance) compared to impedance spectroscopy. By focusing on capacitance changes rather than full impedance spectrum analysis, the system achieves sufficient measurement precision with simpler, more manufacturable equipment

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method provides a means to accurately assess the condition and performance of actuators, improving the detection of defects and mechanical coupling, thereby enhancing the reliability of actuator operations in projection exposure apparatuses, with the ability to measure capacitance with high resolution and account for temperature influences.

Implementation Method 1

mechanically coupled piezoelectric or electrostrictive actuators

Methodology Applied
Scientific EffectPiezoelectric effect: Piezoelectric Effect

Implementation Method 2

mechanically coupled piezoelectric or electrostrictive actuators

Methodology Applied
Scientific EffectElectrostriction: Electrostriction

Implementation Method 3

determining the change in capacitance of the further actuator

Methodology Applied
Scientific EffectCapacitance: Capacitance

Data Source

PatentUS20230228798A1Method and device for measuring actuators in a projection exposure apparatus for semiconductor lithography
Publication Date: 2023.07.20 CARL ZEISS SMT GMBH
  • US20230228798A1 patent drawing
  • US20230228798A1 patent drawing
  • US20230228798A1 patent drawing

AI summary

A method for measuring an actuator in a projection exposure apparatus for semiconductor lithography, comprises: driving and deflecting a first actuator with a constant control signal; deflecting a further actuator by way of the mechanical coupling; and determining the capacitance of the further actuator, which was deflected by way of the coupling. A projection exposure apparatus for semiconductor lithography comprises a control device and a measuring device, wherein the measuring device is configured to determine the capacitance of at least one actuator in the projection exposure apparatus.