Adaptive Control for Vibration-Resistant Nanoimprint Alignment
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Solution Overview
Problem
Nanoimprint lithography faces challenges in achieving fast and consistent alignment due to vibrations introduced during the process, particularly from thin-liquid friction and variations in residual layer thickness, which impact yield and efficiency in mass production.
Innovation Solution
A method and system using feedback-feedforward control with adaptive parameters to increase the viscosity of the resist, align the substrate with a template, and cure the resist, incorporating calibration data and covariance values to minimize vibrations and improve alignment accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If feedback-feedforward control with adaptive parameters is used to reduce vibration, then alignment precision is improved, but device complexity increases
Solution Approach 1:
The control system dynamically adapts parameters based on real-time calibration data and measured vibrations. The feedback-feedforward control mechanism continuously adjusts control parameters to optimize alignment precision while compensating for varying vibration conditions, making the system responsive rather than static.
Solution Approach 2:
The system implements a feedback mechanism where alignment measurements and vibration data are fed back into the control algorithm. This feedback loop enables the system to learn from previous alignments and adjust control parameters accordingly, improving precision while managing complexity through iterative optimization.
2Stability of the object's composition
If viscosity of resist is increased to reduce friction and vibration, then alignment stability is improved, but ease of operation deteriorates
Solution Approach 1:
The system applies energy periodically to increase resist viscosity only during the alignment phase when stability is needed. Before and after this periodic energy application, the resist maintains its normal流动性, allowing easy dispensing and handling. This temporal separation resolves the contradiction between ease of operation and alignment stability.
Solution Approach 2:
The resist undergoes a controlled phase transition from liquid to higher viscosity state through energy application during alignment, then returns to liquid state afterward. This reversible phase transition enables the system to achieve stability when needed while maintaining ease of operation during handling phases.
3Measurement precision
If calibration data is collected and used to update control parameters, then alignment accuracy is improved, but loss of time increases
Solution Approach 1:
The system performs calibration measurements and collects data in advance during initial setup or between production batches. By preparing calibration data beforehand, the system minimizes time loss during actual production alignments, as the control parameters are already optimized based on pre-collected calibration information.
Solution Approach 2:
The system automatically performs calibration measurements and updates control parameters without requiring manual intervention. This self-service capability reduces the time loss associated with calibration by eliminating manual setup and configuration steps, allowing the system to autonomously optimize its performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces vibration-induced errors, enhancing alignment precision and efficiency by adapting control parameters based on real-time and historical data, ensuring accurate pattern transfer in nanoimprint lithography.
Implementation Method 1
obtain calibration data, increase the viscosity of at least a portion of the resist
Implementation Method 2
aligning the substrate with the template using a feedback-feedforward control process
Data Source
AI summary
A method and system for imprinting a substrate supported on a moveable stage is provided and includes contacting a liquid resist on the substrate with a template and aligning the substrate with the template using a feedback-feedforward control process with a first set of control parameters. Calibration data is obtained and the viscosity of at least a portion of the resist is increased. The substrate is then with the template using the feedback-feedforward control process with a second set of control parameters after the viscosity of the resist has increased, the second set of control parameters are determined based on the calibration data and the resist is cured under the template.