Adaptive Flow Rate Control for Processing Liquid Supply
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Solution Overview
Problem
The existing substrate processing systems require numerous adjustments for flow rate control mechanisms due to variations in processing liquid properties and system characteristics, leading to inefficiencies and increased operational complexity when changing processing recipes or conditions.
Innovation Solution
A processing liquid supply device with a flow rate control mechanism that uses a system identification unit to determine system parameters based on operation amounts and detected flow rates, allowing for automatic adjustment of flow rates through a PID control system, thereby minimizing manual intervention and optimizing flow rate control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple processing liquid supply mechanisms are provided to supply different kinds of processing liquids, then the substrate processing system can perform various processing operations, but the number of control parameters that need to be adjusted increases significantly
Solution Approach 1:
The patent creates a universal control parameter adjustment mechanism that can be applied to all processing liquid supply mechanisms regardless of the type of processing liquid. Instead of having separate adjustment procedures for each liquid type and supply mechanism, a single standardized adjustment process is established that works across the entire substrate processing system, thereby reducing overall complexity while maintaining versatility.
Solution Approach 2:
The patent standardizes the control parameters across different processing liquid supply mechanisms, allowing for uniform adjustment procedures. By establishing consistent parameter relationships between valve opening degrees and flow rates across different mechanisms, the system eliminates the need for individual parameter tuning for each supply mechanism, thereby reducing the overall number of independent control parameters while maintaining the ability to handle various processing liquids.
2Measurement precision
If control parameters are adjusted individually for each processing liquid based on physical properties, then accurate flow rate control is achieved, but the adjustment process becomes time-consuming and complex
Solution Approach 1:
The patent establishes predetermined control parameter relationships between valve opening degrees and flow rates for different processing liquids. These relationships are determined in advance and stored as reference data, allowing operators to quickly select and apply appropriate parameters without performing time-consuming individual adjustments each time a processing liquid is changed, thereby maintaining accuracy while reducing adjustment time.
Solution Approach 2:
The patent implements a feedback mechanism where the actual flow rate is measured and compared with the target flow rate, and the control parameters are automatically adjusted based on the deviation. This closed-loop control system maintains accurate flow rate control while eliminating manual adjustment time, as the system self-corrects parameter deviations automatically during operation.
3Measurement precision
If control parameters are optimized for specific supply flow rate ranges, then flow rate control accuracy is improved, but the system requires re-adjustment when processing recipes change
Solution Approach 1:
The patent implements a dynamic control parameter adjustment mechanism that automatically adapts to different supply flow rate ranges and processing recipes. The system monitors the current operating conditions and selectively applies appropriate control parameters based on the detected flow rate range and processing liquid type, thereby maintaining high accuracy across varying conditions without requiring manual re-adjustment for each recipe change.
Solution Approach 2:
The patent pre-establishes multiple sets of control parameters corresponding to different flow rate ranges and processing liquid types. When a processing recipe is loaded, the system automatically selects the appropriate parameter set based on the recipe specifications, eliminating the need for manual optimization for each recipe while maintaining accuracy for the specific operating conditions.
4Measurement precision
If control parameters are adjusted for each processing unit based on supply mechanism characteristics, then flow rate accuracy is improved, but the overall system complexity increases
Solution Approach 1:
The patent creates a centralized parameter management system that handles control parameters for all processing units through a unified interface and methodology. Instead of requiring separate parameter adjustment procedures for each processing unit, the system establishes universal adjustment rules that apply across all units, thereby maintaining accurate flow rate control for each unit while simplifying overall system parameter management through standardization.
Data Source
AI summary
An operation amount for operating a flow rate control mechanism of a processing liquid can be appropriately adjusted based on a physical property of the processing liquid or a characteristic of a processing liquid supply mechanism while supplying the processing liquid. In a processing liquid supply device that supplies a processing liquid to a substrate, a processing liquid supply mechanism discharges the processing liquid toward the substrate via a flow rate control mechanism which controls the processing liquid based on an operation amount. A flow rate detection unit detects a flow rate of the processing liquid supplied to the substrate. A system identification unit determines a system parameter according to a system model of the processing liquid supply mechanism. A flow rate controller determines a new operation amount of the flow rate control mechanism by using the system parameter.