Adaptive Laser System for EUV Light Source Beam Control
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Solution Overview
Problem
Existing EUV light sources face challenges in maintaining consistent beam properties, such as divergence and waist location, particularly at high duty cycles, which affects the power and efficiency of the amplified light beam when interacting with target materials to produce extreme ultraviolet light.
Innovation Solution
The implementation of an adaptive laser system that includes multiple optical amplifiers and adaptive optical elements, like variable radius mirrors, which adjust beam path length and curvature in response to feedback signals to maintain beam properties, ensuring consistent beam divergence and waist location regardless of duty cycle variations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the duty cycle of the amplified light beam is increased to improve EUV light production efficiency, then the power and efficiency of EUV light production is improved, but the beam properties such as divergence and waist location become inconsistent
Solution Approach 1:
The patent employs adaptive optical elements with variable radius of curvature that can dynamically adjust their optical properties in response to duty cycle changes. This allows the beam delivery system to maintain consistent beam properties (divergence, waist location) across different duty cycles by actively adapting the optical path to compensate for variations caused by high-duty-cycle operation
Solution Approach 2:
The system incorporates feedback mechanisms that monitor beam properties and adjust the adaptive optical elements accordingly. This feedback loop ensures that beam divergence and waist location remain consistent even when operating at high duty cycles, resolving the contradiction between productivity improvement and beam property stability
2Stability of the object's composition
If adaptive optical elements are added to maintain beam properties, then beam property consistency is improved, but the device complexity increases
Solution Approach 1:
The patent changes the radius of curvature parameter of the adaptive optical elements to maintain consistent beam properties. By adjusting this single critical parameter dynamically, the system achieves beam property consistency without requiring complex multi-element optical systems, thus managing device complexity while maintaining performance
3Stability of the object's composition
If the beam path length is adjusted to maintain waist location, then beam property consistency is improved, but the device complexity increases
Solution Approach 1:
The patent uses dynamic adjustment of the beam path length through adaptive optical elements that can change their optical path length in real-time. This dynamic control allows the system to maintain consistent waist location despite variations in duty cycle, achieving beam property stability through adaptable optical path management rather than fixed mechanical adjustments
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the power and efficiency of the EUV light production by maintaining optimal beam characteristics, even at high duty cycles, thereby improving the overall performance of the EUV light source.
Implementation Method 1
adaptive optical elements, like variable radius mirrors, which adjust beam path length and curvature in response to feedback signals
Implementation Method 2
converting a material that has an element, for example, xenon, lithium, or tin, with an emission line in the EUV range in a plasma state. In one such method, often termed laser produced plasma (LPP), the required plasma can be produced by irradiating a target material
Implementation Method 3
laser produced plasma (LPP), the required plasma can be produced by irradiating a target material
Implementation Method 4
target material comprising a material that emits extreme ultraviolet light when converted to plasma
Data Source
AI summary
A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.