Adaptive Projection Lens for Microlithography
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Solution Overview
Problem
The challenge faced by manufacturers of projection lenses is that they are not aware of the types of patterns used by end users over the lens's lifetime, leading to stringent imaging quality requirements, which increases complexity and cost, and the lenses may not perform optimally under varying use conditions, especially with aggressive illumination settings and double or quadruple patterning techniques.
Innovation Solution
A projection exposure method and apparatus that adapt the imaging behavior of the projection lens to specific use cases by determining user-specific use case data, including pattern and illumination setting data, to optimize imaging specifications and control controllable optical components, ensuring high-quality imaging of both core and peripheral structures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If stringent imaging quality requirements are imposed on projection lenses to ensure optimal performance under all use conditions, then imaging reliability is improved, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent implements dynamic adaptation of the projection lens by introducing controllable optical components that can modify imaging behavior in real-time based on detected use case conditions. The lens transitions from a static design to a dynamic system that adjusts its characteristics to match the specific patterning task at hand, thereby maintaining high imaging reliability without requiring overly complex fixed specifications.
Solution Approach 2:
The system changes imaging parameters dynamically by detecting use case data (such as illumination settings and pattern characteristics) and adjusting controllable optical components accordingly. This allows the lens to optimize its performance parameters for each specific use case rather than being designed for worst-case scenarios across all possible applications, reducing overall complexity while maintaining reliability.
2Adaptability or versatility
If the projection lens is designed for universal use across all patterning applications, then adaptability is improved, but imaging precision for specific use cases deteriorates
Solution Approach 1:
The projection lens system performs self-adaptation by automatically detecting use case data and adjusting its own imaging behavior without external intervention. The system identifies the specific patterning application being performed and autonomously configures its controllable optical components to optimize imaging precision for that use case, eliminating the trade-off between universal adaptability and specialized precision.
Solution Approach 2:
The system incorporates feedback mechanisms that detect actual use case conditions (illumination settings, pattern characteristics) and use this information to adjust imaging parameters. This closed-loop control enables the lens to maintain high imaging precision across diverse applications by continuously adapting to the specific requirements of each use case rather than relying on fixed universal specifications.
3Manufacturing precision
If manual user intervention is required to optimize imaging settings for different use cases, then imaging precision is improved, but ease of operation deteriorates
Solution Approach 1:
The system eliminates the need for manual user intervention by implementing self-service functionality that automatically detects use case data and adjusts imaging settings accordingly. The projection lens autonomously identifies the patterning application and configures its controllable optical components to achieve optimal imaging precision, thereby maintaining high precision while dramatically improving ease of operation.
Solution Approach 2:
The system uses feedback from detected use case conditions to automatically adjust imaging parameters without user input. By continuously monitoring illumination settings, pattern characteristics, and other relevant parameters, the system self-optimizes imaging precision for each specific application, removing the burden of manual configuration while maintaining high precision performance.
Data Source
AI summary
A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern includes providing the pattern between an illumination system and a projection lens of a projection exposure apparatus so that the pattern is arranged in the region of an object plane of the projection lens and can be imaged via the projection lens into an image plane of the projection lens. The image plane is optically conjugate with respect to the object plane, and imaging-relevant properties of the pattern can be characterized by pattern data. The method also includes illuminating an illumination region of the pattern with an illumination radiation provided by the illumination system in accordance with an illumination setting which is specific to a use case and which can be characterized by illumination setting data.