Adaptive Shield Alignment for Uniform Electroplating Deposition

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Solution Overview

Problem

Existing electrochemical deposition systems face challenges in achieving uniformity of features due to inaccurate alignment and spacing of close patterning shields with respect to workpieces, especially as critical dimensions become smaller, leading to suboptimal deposition uniformity and increased tool downtime.

Innovation Solution

An automated system that delivers and aligns close patterning shields with workpieces within the electrochemical deposition module, ensuring precise positioning and optimal spacing for improved deposition uniformity, reducing manual intervention and installation errors.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If manual alignment and spacing of close patterning shields with workpieces is used, then device complexity is reduced, but manufacturing precision and deposition uniformity deteriorate

Engineering Contradiction:
Improvealignment precisionVSAvoidsystem complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The system performs preliminary measurement of the workpiece position and shield position before the electrochemical deposition process, and pre-calculates the optimal shield spacing distance based on measured parameters. This preliminary action enables precise alignment and spacing to be achieved automatically, resolving the contradiction between manufacturing precision and device complexity.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system incorporates feedback mechanisms where sensors continuously monitor the actual positions of workpieces and shields, and the control system adjusts spacing and alignment based on real-time measurements. This feedback loop ensures high deposition uniformity while managing system complexity through automated control.

Inventive Principle:
Principle #23Feedback

2Reliability

If manual installation of close patterning shields is used, then ease of operation is improved, but reliability and deposition uniformity worsen due to alignment errors

Engineering Contradiction:
Improvealignment accuracyVSAvoidoperation simplicity
Core Design Contradiction:
ReliabilityVSEase of operation

Solution Approach 1:

The system performs self-measurement and self-adjustment of shield positioning based on automatic workpiece detection. The measurement and control systems enable the equipment to automatically achieve precise alignment without requiring manual intervention, thereby improving reliability while maintaining ease of operation through automation.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The patent replaces manual mechanical alignment operations with automated optical/electrical measurement systems and computer-controlled positioning. This substitution eliminates human error in alignment while the automated systems maintain operational simplicity through software control.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Manufacturing precision

If fixed spacing between shields and workpieces is used, then device complexity is reduced, but deposition uniformity deteriorates due to inability to optimize for different workpieces

Engineering Contradiction:
Improvedeposition uniformityVSAvoidspacing control complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The system dynamically adjusts the spacing between close patterning shields and workpieces based on real-time measurements of workpiece characteristics. Rather than using fixed spacing, the system adapts the gap distance to optimize deposition uniformity for each specific workpiece, resolving the contradiction between deposition precision and control complexity through dynamic control.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The system changes the spacing parameter adaptively based on measured workpiece properties and process conditions. By dynamically modifying the gap distance between shield and workpiece, the system optimizes deposition uniformity while the automated control manages the complexity of parameter adjustment.

Inventive Principle:
Principle #35Parameter changes

4Manufacturing precision

If automated measurement and positioning systems are implemented, then manufacturing precision improves, but device complexity and initial cost increase

Engineering Contradiction:
Improvealignment precisionVSAvoidsystem complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The measurement and positioning systems are designed to be universal and multi-functional, serving multiple purposes including workpiece detection, shield alignment, spacing optimization, and process control. This multi-functionality reduces overall system complexity by consolidating measurement capabilities rather than requiring separate specialized systems for each function.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The automated system enhances deposition uniformity by ensuring accurate alignment and spacing of close patterning shields, improving the consistency of feature deposition and reducing tool downtime by minimizing manual errors and optimizing the distance between shields and workpieces.

Implementation Method 1

electrochemical deposition (ECD) are particularly critical

Methodology Applied
Scientific EffectElectrochemical deposition: Electrodeposition

Data Source

PatentUS11942341B2Adaptive focusing and transport system for electroplating
Publication Date: 2024.03.26 ASMPT NEXX INC
  • US11942341B2 patent drawing
  • US11942341B2 patent drawing
  • US11942341B2 patent drawing

AI summary

A system and method for plating a workpiece are described. In one aspect, an apparatus includes a deposition chamber, a workpiece holder adapted for insertion into and removal from the deposition chamber, a shield with patterns of apertures corresponding to features on the workpiece, a shield holder also adapted for insertion into and removal from the deposition chamber and a positioning mechanism to position the workpiece in the workpiece holder such that the pattern of apertures on the shield will align with the corresponding features on the workpiece when the workpiece holder and shield holder are inserted into the deposition chamber.