Adhesion Layer Coating for Batch Substrate Processing Tube
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In batch-type substrate processing apparatuses, the deposition by-product layer on the reaction tube's inner wall accumulates and cracks due to thermal stress, leading to particle generation that degrades thin film properties and reduces productivity, especially when using quartz reaction tubes with nitride layers.
Innovation Solution
A batch-type substrate processing apparatus with an adhesion layer coated on the reaction tube's inner wall, having a coefficient of thermal expansion between the reaction tube and the deposition by-product layer, and a lower elastic modulus than the deposition by-product layer, which reduces thermal stress and improves bonding, allowing for increased in-situ cleaning cycles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a quartz reaction tube is used for batch-type substrate processing, then the reaction tube provides good chemical stability and transparency, but the deposition by-product layer accumulates and cracks due to thermal stress, leading to particle generation that degrades thin film properties
Solution Approach 1:
An adhesion layer is introduced as an intermediary between the quartz reaction tube and the deposition by-product layer. This adhesion layer has a coefficient of thermal expansion between that of the quartz tube and the by-product layer, acting as a buffer to reduce thermal stress and prevent cracking that would otherwise generate particles and degrade thin film quality
Solution Approach 2:
The reaction tube structure is transformed from a single material (quartz) to a composite structure consisting of the quartz reaction tube plus an adhesion layer coating. This composite structure combines the chemical stability of quartz with the thermal stress management properties of the adhesion layer, preventing particle generation while maintaining reliability
2Manufacturing precision
If the deposition by-product layer is removed frequently to prevent particle generation, then thin film quality is maintained, but productivity decreases due to reduced in-situ cleaning cycle
Solution Approach 1:
Instead of completely removing the deposition by-product layer after every substrate deposition, the adhesion layer allows the by-product layer to accumulate to a greater thickness without causing particle generation. This partial retention of the by-product layer extends the in-situ cleaning cycle and improves productivity while maintaining thin film quality
3Productivity
If cleaning gas is supplied to remove the deposition by-product layer, then the reaction tube can be reused, but the quartz reaction tube suffers from corrosion that reduces its lifespan
Solution Approach 1:
The adhesion layer serves as a protective intermediary between the cleaning gas and the quartz reaction tube. When cleaning gas is supplied to remove the deposition by-product layer, the adhesion layer absorbs the corrosive action, preventing direct contact with the quartz tube and thereby extending the reaction tube's lifespan while maintaining productivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The adhesion layer increases the deposition thickness before particle generation, enhancing the in-situ cleaning cycle and productivity by reducing thermal stress and delamination, while also providing higher corrosion resistance to cleaning gases, thus extending the reaction tube's lifespan.
Implementation Method 1
The adhesion layer may have a coefficient of thermal expansion between a coefficient of thermal expansion of the reaction tube and a coefficient of thermal expansion of the deposition by-product layer
Implementation Method 2
a heater disposed outside the reaction tube to provide a thermal energy inside the reaction tube
Implementation Method 3
a deposition gas supply unit configured to supply a deposition gas inside the reaction tube
Data Source
AI summary
Provided is a batch-type substrate processing apparatus. The substrate processing apparatus includes a vertical reaction tube having an internal space for receiving a substrate boat in which a substrate is stacked in multiple stages, a deposition gas supply unit configured to supply a deposition gas inside the reaction tube, a heater disposed outside the reaction tube to provide a thermal energy inside the reaction tube, and an adhesion layer coated on an inner wall of the reaction tube and to which a deposition by-product layer by an excess deposition gas is attached.

