Adhesive and Resin Layer Peeling for Flexible Semiconductor Fabrication
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Solution Overview
Problem
Current methods for fabricating semiconductor and display devices face challenges in achieving low-cost, high-yield production with large-sized substrates, low temperature processing, and high reliability, while also aiming for reduced thickness, weight, flexibility, and resistance to breakage.
Innovation Solution
A method involving the stacking and separation of material layers with specific compound layers and a resin layer, where the first material layer includes a first compound layer with high oxygen content and a second compound layer with high nitrogen content, using light irradiation to separate them, and incorporating a metal compound layer with high thermal conductivity to facilitate peeling and reduce adhesion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If a heat-resistant resin layer is used on a glass substrate for flexible display devices, then the device can achieve flexibility and thinness, but the peeling process becomes difficult and requires high temperatures or complex laser processing
Solution Approach 1:
An adhesive layer is introduced as an intermediary between the glass substrate and the heat-resistant resin layer. This adhesive layer has controlled adhesion strength that allows the resin layer to be easily peeled off after serving its protective function during device fabrication, resolving the contradiction between maintaining flexibility/thinness and enabling easy peeling.
Solution Approach 2:
The adhesion strength of the adhesive layer is optimized to provide sufficient bonding during fabrication but allow easy peeling afterward. By controlling the adhesion parameters of the intermediate layer, the system transitions from a permanently bonded state to a separable state, enabling both flexibility and ease of manufacture.
2Productivity
If conventional peeling methods are used for separating material layers, then the process is simple, but the yield is low due to damage to the substrate or deposited layers
Solution Approach 1:
The conventional mechanical peeling method is replaced with light irradiation (laser processing) to separate the material layers. This optical method reduces mechanical stress and damage to the substrate and deposited layers, significantly improving yield despite the added process complexity.
Solution Approach 2:
Light irradiation induces localized heating and phase transitions at the interface between layers, enabling clean separation without mechanical contact. This thermal-optical approach minimizes damage while achieving effective layer separation, improving productivity.
3Ease of manufacture
If high temperatures are used for peeling the resin layer from the substrate, then the peeling is effective, but the deposited layers and substrate may be damaged
Solution Approach 1:
The adhesive layer serves as a thermal buffer and intermediary that allows effective peeling at lower temperatures. It absorbs and distributes thermal energy, enabling successful separation without subjecting the substrate and deposited layers to damaging high temperatures, thus maintaining reliability.
Solution Approach 2:
Light irradiation is applied locally at the interface between layers rather than heating the entire substrate uniformly. This localized heating approach achieves effective peeling at the specific separation point while keeping the rest of the substrate and layers at safe temperatures, preserving substrate integrity.
4Ease of manufacture
If simple material layers are used without compound structures, then the fabrication is easier, but the adhesion and peeling control are insufficient
Solution Approach 1:
The adhesive layer is designed as a composite material with specific combinations of polymers and additives that provide both adequate adhesion during fabrication and controlled peeling afterward. This composite structure achieves reliable adhesion control while maintaining relatively simple fabrication processes.
Solution Approach 2:
The single resin layer is segmented into multiple functional sub-layers with different properties: one portion provides strong adhesion to the substrate during fabrication, while another portion allows easy peeling after device completion. This segmentation enables both fabrication simplicity and reliable adhesion control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the production of semiconductor and display devices with low power consumption, high reliability, flexibility, and reduced thickness, while maintaining high yield and cost-effectiveness, and allows for the use of large-sized substrates and low-temperature processing.
Implementation Method 1
the first material layer and the second material layer are separated from each other by irradiation of an interface between the first material layer and the second material layer or the vicinity of the interface with light
Implementation Method 2
incorporating a metal compound layer with high thermal conductivity to facilitate peeling and reduce adhesion
Data Source
AI summary
A high-yield fabricating method of a semiconductor device including a peeling step is provided.A peeling method includes a step of stacking and forming a first material layer and a second material layer over a substrate and a step of separating the first material layer and the second material layer from each other. The second material layer is formed over the substrate with the first material layer therebetween. The first material layer includes a first compound layer in contact with the second material layer and a second compound layer positioned closer to the substrate side than the first compound layer is. The first compound layer has the highest oxygen content among the layers included in the first material layer. The second compound layer has the highest nitrogen content among the layers included in the first material layer. The second material layer includes a resin. In the step of separating, the first material layer and the second material layer are separated from each other by irradiation of an interface between the first material layer and the second material layer or the vicinity of the interface with light.


