Adhesive Substrate Carrier for Vertical ALD Processing
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Solution Overview
Problem
Prior art gas deposition apparatuses face challenges in efficiently placing substrates in a vertical position and preventing backside deposition, with existing solutions being cumbersome and expensive.
Innovation Solution
A substrate is detachably attached to a support using an adhesive, allowing for easy vertical positioning and preventing backside deposition by using an adhesive layer that attaches the substrate tightly to the support, thereby simplifying the loading process and avoiding complex support structures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If substrates are placed in vertical position using prior art substrate supports, then the substrate can be processed in vertical position, but the placement process becomes cumbersome and complicated
Solution Approach 1:
The patent replaces complex mechanical substrate support structures with a chemical bonding mechanism. An adhesive layer is applied to the substrate support, creating a simple chemical bond that automatically holds the substrate in vertical position without requiring complicated mechanical gripping or positioning mechanisms. This substitution dramatically simplifies both the support structure and the substrate placement operation.
2Reliability
If prior art substrate supports are used to hold substrates, then substrates can be supported during processing, but backside deposition occurs on the substrate
Solution Approach 1:
The adhesive layer is applied selectively only to the specific region of the substrate support that contacts the substrate's backside surface. This localized application provides support exactly where needed while leaving the rest of the substrate accessible to the deposition process. The adhesive's selective placement prevents harmful backside deposition while maintaining reliable substrate support during processing.
3Object-generated harmful factors
If complicated solutions like porous pieces or planar carriers are used to prevent backside deposition, then backside deposition is reduced, but the device becomes more complex and expensive
Solution Approach 1:
The adhesive layer functions as a temporary, consumable element that performs its prevention function during the deposition process and can be easily removed or replaced. This disposable adhesive approach is much simpler and less expensive than permanent mechanical structures like porous pieces or precision planar carriers. The adhesive achieves backside deposition prevention without requiring complex, expensive, or difficult-to-maintain device components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables easy and simple attachment of substrates in vertical positions within the reaction chamber while preventing backside deposition, eliminating the need for complicated support solutions and reducing costs.
Implementation Method 1
a substrate is arranged to be detachably connected to the substrate support by means of an adhesive
Data Source
AI summary
The invention relates to an arrangement for processing a substrate in a reaction chamber of a gas deposition apparatus by exposing the substrate to alternate, saturated surface reactions of starting materials, the arrangement comprising loading means for loading the substrate into the reaction chamber on a substrate support. In accordance with the invention, the substrate is arranged for being attached in a detachable manner with an adhesive to the substrate carrier.