Adjustable Gas Distribution Assembly for Uniform Deposition

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Solution Overview

Problem

Existing gas-phase reactors require time-consuming and costly processes to adjust the gap between the shower plate and gas channel, affecting gas conductance and film deposition uniformity, and existing shower plates need replacement for different conditions, impacting efficiency and cost.

Innovation Solution

A gas distribution assembly with adjustable gap devices that allow manual or remote adjustment of the gas channel relative to the shower plate, enabling precise control of the gap size and tilt, and includes sealing structures to maintain vacuum and RF propagation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the gap between shower plate and gas channel is changed to adjust gas conductance, then film deposition uniformity is improved, but equipment efficiency deteriorates due to time-consuming replacement steps

Engineering Contradiction:
Improvefilm deposition uniformityVSAvoidequipment efficiency
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The gas channel is made adjustable through mechanical devices (screws, bolts, or motorized actuators) that enable dynamic modification of the gap between the shower plate and gas channel. This allows the system to adapt to different deposition requirements without physical replacement, resolving the contradiction between achieving uniform film deposition and maintaining equipment efficiency.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

A single gas channel assembly is designed to perform multiple functions: it can be adjusted to different gap positions and tilted to various angles to accommodate different deposition conditions. This multi-functionality eliminates the need for multiple specialized components, thereby improving productivity while maintaining manufacturing precision.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Ease of operation

If shower plate replacement is performed to adjust gas distribution, then gas flow control is improved, but time and cost increase due to disassembly and reassembly steps

Engineering Contradiction:
Improvegas flow controlVSAvoiddisassembly and reassembly time
Core Design Contradiction:
Ease of operationVSLoss of time

Solution Approach 1:

The gas channel incorporates adjustable gap devices with screws, bolts, or motorized actuators that enable continuous modification of the gap size and tilt angle. This dynamic adjustment capability allows operators to optimize gas flow distribution without time-consuming replacement procedures, directly addressing the contradiction between ease of operation and time loss.

Inventive Principle:
Principle #15Dynamics

3Adaptability or versatility

If multiple shower plates are used for different conditions, then adaptability is improved, but device complexity and cost increase

Engineering Contradiction:
Improvegas distribution adaptabilityVSAvoidshower plate variety
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

A single universal gas channel assembly is designed with adjustable gap devices and tilt mechanisms that enable it to adapt to various deposition conditions. This eliminates the need for multiple specialized shower plates, reducing device complexity and cost while maintaining high adaptability for different gas distribution requirements.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The gas channel's gap and tilt are made dynamically adjustable, allowing one component to replace multiple fixed configurations. This dynamic capability provides the same adaptability as having multiple shower plates but with significantly reduced complexity and cost.

Inventive Principle:
Principle #15Dynamics

Data Source

PatentUS12431334B2Gas distribution assembly
Publication Date: 2025.09.30 ASM IP HLDG BV
  • US12431334B2 patent drawing
  • US12431334B2 patent drawing
  • US12431334B2 patent drawing

AI summary

A gas distribution assembly and methods for adjusting the gas flow through a gas supply unit into a reaction chamber are disclosed. The gas distribution assembly and methods can be used to increase or decrease gas flow uniformly through the gas supply unit. The gas distribution assembly and methods can also be used to increase gas flow into one area of the reaction chamber, while decreasing gas flow into another area.