Adjustable Guide Member for Supercritical Drying Airflow
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Solution Overview
Problem
Conventional substrate drying methods, such as rotary drying, risk collapsing patterns on substrates, and supercritical drying processes face issues with airflow uniformity due to the absence of effective guiding structures, leading to inefficiencies in process time and productivity.
Innovation Solution
A substrate treating apparatus with a chamber body, substrate support unit, fluid supply and exhaust units, and a guide member that surrounds the substrate to enhance airflow uniformity, including a guide block with through holes and a block driving unit to adjust the gap between the guide block and the substrate, facilitating efficient supercritical fluid treatment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a substrate guide is provided to mount the substrate in the supercritical treating space, then the substrate can be properly positioned and supported, but the shapely asymmetry of the guide member causes poor uniformity of airflow
Solution Approach 1:
The substrate guide member is divided into multiple segments: a guide member body and multiple guide members that can be independently adjusted. This segmentation allows each guide member to be positioned to optimize airflow paths while collectively providing stable substrate support, resolving the conflict between positioning reliability and airflow uniformity.
Solution Approach 2:
The guide members are designed with adjustable positions rather than fixed positions. This dynamic configuration allows the system to adapt the guide member arrangements to achieve both proper substrate mounting and uniform airflow distribution, eliminating the shapely asymmetry problem while maintaining positioning reliability.
2Device complexity
If the outer space of the substrate is left empty without special functions, then the substrate guide structure is simple, but the airflow uniformity deteriorates
Solution Approach 1:
The guide members serve multiple functions: they provide structural support for substrate positioning and simultaneously act as airflow guides to improve flow uniformity. This multi-functionality eliminates the need for separate airflow guiding structures, maintaining structural simplicity while achieving uniform airflow.
Solution Approach 2:
The guide members are strategically positioned in specific locations around the substrate periphery where they can most effectively guide airflow. This localized placement optimizes airflow uniformity without requiring complex structures throughout the entire treating space, balancing simplicity and performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus reduces process time, improves productivity, and ensures better airflow uniformity, effectively supporting the substrate during supercritical drying processes without pattern collapse.
Implementation Method 1
supplying a treating fluid (e.g., carbon dioxide) in a supercritical state onto the substrate to remove an organic solvent remaining on the substrate
Implementation Method 2
the drying gas phase changes to the supercritical state
Implementation Method 3
an organic solvent such as an isopropyl alcohol (IPA) onto the substrate to replace a rinsing liquid remaining on the substrate with an organic solvent having a low surface tension
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber body having a top body and a bottom body which combine to provide a treating space therein; a substrate support unit configured to support a substrate at the treating space; a fluid supply unit configured to supply a treating fluid to the treating space; a fluid exhaust line for exhausting the treating fluid from the treating space; and a guide member provided to surround a periphery of the substrate supported by the substrate support unit.