Adjustable Magnetron Assembly for Uniform Coating on Complex Substrates
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Solution Overview
Problem
Magnetron sputtering systems with rotary cathodes face limitations in precisely controlling the magnetic field shape and intensity, which restricts the ability to achieve uniform coating on non-planar substrates, leading to inefficiencies and increased costs.
Innovation Solution
A magnetron sputtering method that uses a magnetron assembly with multiple magnets attached to individual yokes, each coupled with actuating mechanisms, allowing for precise adjustment of yoke positions based on parameters like coating thickness, magnetic field intensity, or substrate shape, enabling localized control of the coating profile.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If magnets are attached to a single yoke structure, then the device complexity is reduced, but the manufacturing precision of coating profile deteriorates
Solution Approach 1:
The patent divides the magnet bar structure into multiple independent segments, each with its own yoke and actuating mechanism. This segmentation allows independent positioning of each magnet segment, enabling precise control of the magnetic field distribution and coating profile on non-planar substrates while maintaining manageable device complexity through modular design.
2Device complexity
If the magnet bar structure is made rigid, then the device complexity is reduced, but the adaptability to non-planar substrates deteriorates
Solution Approach 1:
The patent transforms the rigid magnet bar structure into a dynamic, adjustable system where each magnet segment can be independently positioned along the substrate surface. The actuating mechanisms enable real-time reconfiguration of the magnetic field to match complex substrate geometries, significantly improving adaptability while maintaining controlled device complexity through systematic design.
3Device complexity
If manual adjustment of magnet positions is used, then the device complexity is reduced, but the productivity deteriorates
Solution Approach 1:
The patent implements automated actuating mechanisms that enable the magnet bar structure to self-adjust to the substrate surface geometry without manual intervention. The system automatically configures the magnetic field distribution to match the substrate contours, significantly improving productivity while keeping device complexity manageable through standardized actuating components.
4Productivity
If the magnetic field intensity is increased, then the coating deposition speed is improved, but the manufacturing precision of coating uniformity deteriorates
Solution Approach 1:
The patent applies local quality by enabling independent adjustment of magnetic field intensity at different locations along the substrate surface. Each magnet segment can be positioned and configured to provide optimal field strength for its specific region, allowing high deposition speeds in areas requiring fast coating while maintaining uniformity control in sensitive areas, thus resolving the contradiction between speed and precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for high-quality, efficient coating on complex substrates by accurately manipulating the magnetic field, reducing operation costs and enhancing precision, and can be automated for improved efficiency.
Implementation Method 1
Magnetron sputtering with rotary cathodes has long been employed in the glass coating industry
Implementation Method 2
Locally tailoring the magnetic field strength in magnetron sputtering with rotary cathodes offers a precise control of the target erosion
Data Source
AI summary
A method and a system for adjustable coating on a substrate using a magnetron sputtering apparatus are provided. The method comprises the steps of providing a magnetron assembly which comprises a plurality of magnets attached to a plurality of yokes and a plurality of actuating mechanisms (208), each operatively coupled to at least one of the plurality of yokes. The method further comprises automatically determining individual positions of each of the plurality of yokes of the magnetron assembly on the basis of at least one parameter, and adjusting individually positions of each of the plurality of yokes of the magnetron assembly in accordance with the automatically determined individual positions.