Adjustable Reflector Assembly for Uniform Substrate Heating
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current thermal processing chambers for semiconductor fabrication lack precise control over substrate heating, as they are limited to adjusting kilowatt power to lamps, which restricts the ability to achieve uniform and desired thermal profiles.
Innovation Solution
An adjustable reflector assembly with actuation mechanisms is introduced, allowing for the adjustment of the reflector profile to control the focal length and distribution of radiation, combined with lamps operating at different wavelengths to optimize thermal processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If kilowatt power to lamps is adjusted, then substrate heating control is achieved, but thermal profile uniformity and precision are limited
Solution Approach 1:
The reflector is divided into multiple independently adjustable segments or zones. Each segment can be individually positioned to control the direction and distribution of reflected radiation, enabling precise local thermal profile adjustment on the substrate without requiring complex changes to the lamp power system.
Solution Approach 2:
The reflector assembly incorporates adjustable or movable elements that can dynamically change their position or orientation during operation. This dynamic adjustability allows real-time optimization of thermal profiles for different substrate types and processing conditions, achieving precise control without permanent system reconfiguration.
2Adaptability or versatility
If multiple substrate types are processed, then versatility is improved, but processing complexity increases
Solution Approach 1:
The adjustable reflector assembly serves multiple functions: it can create different thermal profiles, focus radiation on various substrate regions, and adapt to different substrate sizes and types. This single multi-functional mechanism replaces what would otherwise require multiple specialized heating systems, achieving versatility without proportional increases in overall system complexity.
Solution Approach 2:
The system changes operational parameters by adjusting the reflector geometry and position rather than requiring different hardware configurations for different substrates. By varying reflector angles, distances, and orientations, the same apparatus can optimize heating for diverse substrate types, maintaining simplicity while achieving adaptability.
3Manufacturing precision
If radiation focal length is controlled, then heating uniformity is improved, but reflector system complexity increases
Solution Approach 1:
Different zones of the reflector are designed with locally optimized properties - certain segments may have specific curvatures, angles, or surface characteristics tailored to direct radiation to particular regions of the substrate. This local optimization achieves uniform heating across the entire substrate while keeping each individual reflector element relatively simple in design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables precise control over thermal profiles, allowing for more efficient and uniform heating of substrates, improving the ability to achieve desired temperature ranges and reducing the complexity of processing multiple substrate types.
Implementation Method 1
The first surface is a reflective surface and is configured to face a lamp
Implementation Method 2
an array of high-intensity incandescent lamps fit into a lamp head and directed at the substrate
Implementation Method 3
a substantial fraction of their radiation can be directed to the substrate. As a result, the substrate can be very quickly heated
Data Source
AI summary
Embodiments herein are generally directed to electronic device manufacturing and, more particularly, to systems and methods for lamp heating in thermal processing chambers. In an embodiment, an adjustable reflector assembly includes a plurality of elements including at least one stationary element and at least one rotating element, wherein a first surface of each of the plurality of elements is a reflective surface, and at least one actuation mechanism configured to actuate the at least one rotating element relative to the stationary element. A method of processing a substrate includes measuring a thermal intensity of a thermal profile of an area of a substrate under a lamp and the reflector assembly, determining if the thermal intensity is outside of desired parameters, and in response to the thermal intensity being outside of desired parameters, and adjusting a reflector profile of the reflector assembly.