Adjustable RF Feeding Structure for Uniform PECVD Electrode Potential
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Solution Overview
Problem
Existing radio frequency feeding structures in PECVD apparatuses suffer from poor potential uniformity due to electromagnetic effects, and multi-point fixed feeding modes are cumbersome and difficult to adjust.
Innovation Solution
A radio frequency feeding structure with a first connecting member and multiple adjustable second connecting members, allowing for a multi-point feeding mode, which can be adjusted to improve electric potential distribution uniformity and mitigate electromagnetic effects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If single-point feeding mode is used, then the feeding structure is simple, but the potential uniformity is poor due to electromagnetic effects
Solution Approach 1:
The patent divides the single feeding point into multiple feeding points (at least two) distributed across the electrode plate. This segmentation allows the radio frequency signal to be transmitted through multiple paths, reducing the impact of electromagnetic effects like standing waves and skin effect on any single point, thereby improving potential uniformity across the electrode surface while maintaining relatively simple structure through modular connection members
2Manufacturing precision
If multi-point fixed feeding mode is used, then the potential uniformity is improved, but the installation and adjustment become cumbersome and inconvenient
Solution Approach 1:
The patent employs movable connection members that can slide along guide rails or adjustable mounting structures on the electrode plate. This dynamic design allows the feeding points to be repositioned flexibly according to experimental requirements and electromagnetic interference patterns, maintaining good potential uniformity while enabling easy installation, removal, and adjustment without complex fixed mounting procedures
3Productivity
If frequency of power supply is increased to improve deposition rate, then the deposition rate and film quality improve, but electromagnetic effects worsen affecting potential uniformity
Solution Approach 1:
By segmenting the feeding into multiple points, the patent reduces the wavelength-to-dimension ratio effects at high frequencies. The distributed feeding points create multiple interference patterns that can be balanced to achieve more uniform overall potential distribution, allowing higher operating frequencies to be used for improved deposition rates without sacrificing uniformity
Solution Approach 2:
The patent allows for non-uniform distribution of feeding points across the electrode plate, placing them at locations where electromagnetic field analysis indicates optimal potential distribution. This local optimization ensures that areas with different electromagnetic characteristics receive appropriate feeding, maintaining potential uniformity even at high frequencies that enable high deposition rates
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances film deposition uniformity, deposition rate, and apparatus stability while facilitating quick and accurate installation and adjustment, reducing electromagnetic interference.
Implementation Method 1
PECVD apparatus adopts a radio frequency plasma source, which has the characteristics of high frequency and low plasma bombardment
Implementation Method 2
Increasing the frequency of plasma glow discharge is helpful for improving the quality and deposition rate of microcrystalline silicon films
Implementation Method 3
Plasma-Enhanced Chemical Vapor Deposition (PECVD) is widely applied in the production of solar cells
Data Source
AI summary
This application discloses a radio frequency feeding structure and a PECVD apparatus with the same, which belongs to the field of chemical vapor deposition. A radio frequency feeding structure is used for a PECVD apparatus. The radio frequency feeding structure includes: at least one first connecting member, the first end of the first connecting member is connected to a radio frequency power supply system; a fixing plate, the fixing plate is provided with a fixing hole, the fixing hole extends in a first direction, and the second end of the first connecting member is connected to the fixing hole; a plurality of second connecting members, the first end of each second connecting member is connected to the fixing hole, and the first end of the second connecting member is adapted to move in the first direction along the fixing hole, and the second end of the second connecting member is used for electrically connecting to an electrode in the reaction chamber of the PECVD apparatus. This application can realize a multi-point feeding mode, which helps to improve the uniformity of the electric potential distribution, and can alleviate the problems of inconvenient installation, disassembly and adjustment of the current multi-point fixed feeding mode.