Adjustable Shadow Mask Shutter for Blank Mask Deposition
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Solution Overview
Problem
The existing methods for manufacturing multilayer thin film blank masks in semiconductor production face inefficiencies due to layer lifting defects at the outer boundaries, requiring multiple shadow masks of varying sizes and complex deposition processes.
Innovation Solution
A shadow mask with adjustable shutters that move from the edge to the center of an opening, allowing for precise size adjustment of the opening, and a detection unit connected to a transmission unit to facilitate hydraulic or pneumatic movement, enabling the use of a single mask for multiple film deposition processes without the need for frequent replacements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple shadow masks of varying sizes are used for different thin film deposition processes, then the manufacturing precision and quality of multilayer thin films are improved, but the device complexity and manufacturing time increase due to frequent mask replacements
Solution Approach 1:
The patent applies the dynamics principle by making the shadow mask adjustable through a shutter mechanism that can change the opening size dynamically. The shutter moves along guide rails to adjust the opening from fully open to partially closed positions, allowing a single mask to serve multiple deposition processes with different aperture requirements, thereby eliminating the need for multiple fixed-size masks
Solution Approach 2:
The patent implements universality by designing a single shadow mask that can perform multiple functions through its adjustable shutter mechanism. The mask can be configured for different opening sizes to accommodate various thin film deposition processes, making one mask replaceable for multiple purposes that previously required separate dedicated masks
2Manufacturing precision
If multiple shadow masks of varying sizes are used for different thin film deposition processes, then the manufacturing precision is improved, but the loss of time increases due to frequent mask replacements
Solution Approach 1:
The dynamic shutter adjustment mechanism allows the shadow mask to be reconfigured during the deposition process without physical replacement. The shutter can move along guide rails to change opening sizes in real-time, eliminating the time-consuming steps of removing and installing different sized masks between deposition steps
3Device complexity
If a single shadow mask is used for multiple film deposition processes, then the device complexity is reduced, but the manufacturing precision deteriorates due to layer lifting defects at outer boundaries
Solution Approach 1:
The adjustable shutter mechanism allows precise control of the opening size during deposition, enabling the single mask to achieve different aperture dimensions needed for various thin film layers. This dynamic adjustment prevents the layer lifting defects that occur with fixed masks by ensuring proper boundary control for each deposition step
Solution Approach 2:
The patent applies parameter changes by varying the opening size parameter of the shadow mask through shutter adjustment. The shutter can be positioned at different locations along the guide rail to change the effective aperture diameter, allowing the same mask to produce different opening sizes required for precise thin film boundary definition in each deposition process
4Manufacturing precision
If frequent mask changes are performed, then the manufacturing precision for different thin film sizes is maintained, but the productivity decreases
Solution Approach 1:
The dynamic shutter adjustment enables the shadow mask to be reconfigured during deposition processes without physical replacement. The shutter mechanism allows rapid adjustment of opening sizes to match different thin film deposition requirements, maintaining manufacturing precision while significantly improving productivity by eliminating mask replacement steps
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution simplifies the manufacturing process by allowing for precise control of the opening size, reducing defects and eliminating the need for frequent mask changes, thereby improving the efficiency and quality of multilayer thin film blank mask production.
Implementation Method 1
The transmission unit may be an actuator configured to convert the force received from the detection unit into a movement of the shutter via hydraulic or pneumatic pressure
Implementation Method 2
The transmission unit may be an actuator configured to convert the force received from the detection unit into a movement of the shutter via hydraulic or pneumatic pressure
Data Source
AI summary
A shadow mask includes a mask including one surface, another surface, and an opening that passes from one surface to the other, and a shutter provided on the one surface of the mask and configured to adjust a size of the opening, wherein the shutter is configured to move from an edge to a center of the opening to adjust the size of the opening, and the shadow mask is applied in manufacturing a blank mask for a semiconductor lithography process.