Adjustable Showerhead Zones for Spatial ALD Throughput
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Solution Overview
Problem
State-of-the-art spatial ALD tools with fixed-sized process zones are inefficient when switching between different combinations of process gases, leading to suboptimal throughput and gas wastage due to fixed exposure times.
Innovation Solution
A showerhead with adjustable process zones, enabled by multi-way valve assemblies that can connect gas channels to various gas sources or exhaust, allowing for optimization of exposure times and zone sizes based on the specific gases used.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If fixed-sized process zones are used in the showerhead, then the device structure is simple, but the throughput is suboptimal when switching between different process gas combinations
Solution Approach 1:
The showerhead is divided into multiple independently controllable process zones, each with its own gas supply channel and multi-way valve assembly. This segmentation allows different zones to have different gas exposures simultaneously, enabling optimized throughput for multiple process gases without requiring complete reconfiguration of the showerhead structure.
Solution Approach 2:
The multi-way valve assemblies enable dynamic switching of gas supply to each process zone, allowing the system to adapt the process zone configuration in real-time based on the specific process gas combination being used. This dynamic capability optimizes throughput without permanently altering the showerhead structure.
2Loss of energy
If fixed-sized process zones are used, then the device is easy to operate, but process gas is wasted due to exposure times longer than needed for saturation
Solution Approach 1:
Each process zone can be independently configured with the specific gas exposure time needed for that particular process gas, rather than using a uniform exposure time for all zones. This local optimization eliminates gas waste from excessive exposure while maintaining the simple operation of a standardized showerhead structure.
Solution Approach 2:
The system changes the operational parameters (gas supply configuration) of each process zone independently through the multi-way valve assemblies, allowing optimization of exposure times for different process gases without modifying the physical structure or complicating the operation procedure.
3Adaptability or versatility
If the showerhead configuration is optimized for one process gas combination, then the throughput is optimal for that combination, but the throughput becomes suboptimal when switching to different process gas combinations
Solution Approach 1:
The showerhead is designed with multi-way valve assemblies that enable each process zone to serve multiple functions by switching between different gas supplies. This universal design allows the same showerhead structure to optimize throughput for any process gas combination without requiring physical reconfiguration.
Solution Approach 2:
The system dynamically reconfigures the gas supply to each process zone through the multi-way valve assemblies, allowing the showerhead to adapt to different process gas combinations while maintaining optimal throughput. This dynamic switching capability provides both versatility and sustained productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution optimizes throughput and gas usage by allowing adjustable process zones, ensuring optimal exposure times for each gas, thereby improving the efficiency of the spatial atomic layer deposition process.
Implementation Method 1
the SALD-apparatus comprises a plurality of multi-way valve assemblies, each multi-way valve assembly being fluidly connected to one gas channel of the plurality of gas channels of the showerhead, wherein each multi-way valve assembly is switchable to fluidly connect the respective gas channel that is fluidly connected to the multi-way valve assembly with a selected one of a plurality of different gas sources
Implementation Method 2
spatial atomic layer deposition (SALD-) apparatus
Data Source
AI summary
A spatial atomic layer deposition apparatus (10), including a showerhead (16) with a showerhead side (18) having a center, a central area and a circumferential area. The apparatus also includes a susceptor (12) having a substrate support side that extends parallel to and of opposite the showerhead side forming a gap. The susceptor and the showerhead are rotatable relative to each other around an axis of rotation. The apparatus has a plurality of switchable showerhead sections. The apparatus also includes a plurality of multi-way valve assemblies. Each switchable showerhead section is fluidly connected with one of the plurality of multi-way valve assemblies, so as to fluidly connect a selected one of a plurality of different gas sources with that switchable showerhead section.