Adjustable Vibration Isolation for Imprint Lithography
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Solution Overview
Problem
Imprint lithography faces challenges in achieving high throughput while maintaining accuracy due to the use of vibration isolation systems that are not suitable for the high forces exerted during the imprint process, leading to significant displacement of the support structure and increased idle time between imprint cycles.
Innovation Solution
An adjustable vibration isolation system with a control unit that modifies the dynamical characteristics, such as damping, during the imprint process to reduce displacement of the support structure relative to the base, using components like magneto-rheological dampers or actuators to counteract forces and maintain position stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a vibration isolation system with low stiffness and damping is used to reduce displacement during alignment, then manufacturing precision is improved, but productivity deteriorates due to increased idle time between imprint cycles
Solution Approach 1:
The vibration isolation system transitions from a static configuration to a dynamic one by adjusting damping characteristics based on operational phase. During alignment, low damping provides vibration isolation for precision. During imprinting, high damping is activated to counteract imprint forces and reduce support structure displacement, enabling faster cycle times without sacrificing accuracy.
Solution Approach 2:
The system changes the damping parameter of the vibration isolation system based on the operational phase. By adjusting the damping coefficient from low (during alignment) to high (during imprinting), the system optimizes performance for each phase - maintaining precision during alignment while enabling high throughput during imprinting by rapidly counteracting forces.
2Productivity
If high forces are exerted during the imprint process to achieve sufficient throughput, then productivity is improved, but manufacturing precision deteriorates due to displacement of the support structure
Solution Approach 1:
The control unit anticipates the imprint forces before they are fully applied and activates the adjustable damping mechanism in advance. By pre-positioning the vibration isolation system in a high-damping state, the system is prepared to immediately counteract the forthcoming imprint forces, preventing support structure displacement and maintaining position stability during high-force imprinting operations.
Solution Approach 2:
The control unit monitors the operational phase and dynamically adjusts the damping characteristics of the vibration isolation system. During imprinting, the system detects the application of imprint forces and increases damping to counteract these forces, thereby maintaining position stability. This closed-loop control enables high forces to be applied without compromising precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the idle time between imprint cycles by minimizing displacement and maintaining position stability, allowing for increased throughput without compromising accuracy.
Implementation Method 1
The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base
Implementation Method 2
The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process
Data Source
AI summary
An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.