Adversarial Input Masking for Machine Learning Model Robustness

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Solution Overview

Problem

Machine learning models are vulnerable to adversarial examples, which are intentionally modified inputs that can fool the model into providing incorrect outputs, posing risks to safety, security, and privacy, and existing methods require re-training the model to counter these threats.

Innovation Solution

A method that involves adding a randomly generated mask to the input, scaled by a specific factor, before it is provided to the machine learning model, using techniques such as random noise, cryptographic ciphers, or pseudo-random number generators, to negate the effect of adversarial perturbations without requiring re-training of the model.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If adversarial perturbations are applied to inputs, then the machine learning model outputs incorrect answers with high confidence, but the model's reliability deteriorates

Engineering Contradiction:
Improvemodel reliabilityVSAvoidadversarial example impact
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

A mask generator is introduced as an intermediary component between the input and the machine learning model. The mask generator receives the input and generates a mask that is added to the input before being processed by the ML model. This intermediary mask negates the effect of adversarial perturbations while preserving the original input information, thereby protecting the model's reliability without requiring retraining.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The system applies preliminary anti-action by generating and adding a mask to the input before it reaches the machine learning model. This pre-processing step counteracts the adversarial perturbations in advance, preventing the model from being fooled by adversarial examples. The mask is designed to neutralize the harmful effects while maintaining the correctness of valid inputs.

Inventive Principle:
Principle #9Preliminary anti-action

2Reliability

If the model is re-trained to counter adversarial examples, then the model's resistance to adversarial examples improves, but the complexity and time consumption increase

Engineering Contradiction:
Improveadversarial resistanceVSAvoidsystem complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

Instead of retraining the complex ML model, a separate mask generator component is introduced. This intermediary component handles the adversarial defense task, leaving the original ML model unchanged. The mask generator is a simpler system that can be implemented without modifying the trained model, thereby reducing overall system complexity while maintaining adversarial resistance.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The system is segmented into two independent parts: the original machine learning model and the mask generator. The mask generator handles the adversarial defense function separately, allowing the ML model to remain unchanged and retain its original performance. This segmentation avoids the complexity of retraining the entire system while achieving adversarial robustness.

Inventive Principle:
Principle #1Segmentation

3Reliability

If a mask is added to the input, then the model's resistance to adversarial examples improves, but the processing time increases

Engineering Contradiction:
Improveadversarial resistanceVSAvoidprocessing time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The mask generator applies a simplified processing approach by generating and adding a mask to the input. This partial action (adding a mask) is sufficient to counteract adversarial perturbations without requiring full retraining or complex modifications to the ML model. The mask generation process is designed to be computationally efficient, minimizing the additional processing time while achieving the desired adversarial resistance.

Inventive Principle:
Principle #16Partial or excessive action

Data Source

PatentUS11410078B2Method and data processing system for making machine learning model more resistent to adversarial examples
Publication Date: 2022.08.09 NXP BV
  • US11410078B2 patent drawing
  • US11410078B2 patent drawing
  • US11410078B2 patent drawing

AI summary

A method and data processing system for making a machine learning model more resistant to adversarial examples are provided. In the method, an input for a machine learning model is provided. A randomly generated mask is added to the input to produce a modified input. The modified input is provided to the machine learning model. The randomly generated mask negates the effect of a perturbation added to the input for causing the input to be an adversarial example. The method may be implemented using the data processing system.