AFM Sensor Tip Functionalization Using Activated Vapour Silanisation

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Solution Overview

Problem

Existing methods for functionalizing atomic force microscopy (AFM) tips are material-specific and require complex procedures, lacking versatility in terms of compatible materials and biomolecules, especially for steep topographies.

Innovation Solution

The use of activated vapor silanization (AVS) to deposit a functionalized thin film on AFM tips, creating a high density of amine, carboxyl, thiol, or hydroxyl groups on the surface, independent of the tip's material chemistry, through a method involving evaporation, activation, and impingement of organometallic compounds.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional functionalization methods are used, then specific interactions can be established with biomolecules, but the process becomes material-specific and complex

Engineering Contradiction:
Improvespecific interaction capabilityVSAvoidfunctionalization procedure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies universality by developing a functionalization method that works across multiple tip materials (silicon, silicon nitride, boron nitride) through activated vapour silanisation. The method uses organometallic compounds that can be deposited and activated on different substrate materials, creating a universal approach that eliminates material-specific procedures while maintaining reliable specific interactions with biomolecules through functional groups like amines, carboxyls, thiols, and hydroxyls

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent employs parameter changes by controlling the activation temperature (400-1000°C) and vapour deposition conditions to transform organometallic compounds into functionalized surfaces. By adjusting these parameters, the method achieves consistent functional group formation on different tip materials, simplifying the overall process while maintaining interaction reliability

Inventive Principle:
Principle #35Parameter changes

2Adaptability or versatility

If tip surface modification is performed to generate functional groups, then specific binding capability is achieved, but the process is material-specific and complicated

Engineering Contradiction:
Improvecompatibility with different materials and biomoleculesVSAvoidfunctionalization process simplicity
Core Design Contradiction:
Adaptability or versatilityVSEase of manufacture

Solution Approach 1:

The patent achieves versatility by creating a universal functionalization protocol that accommodates various tip materials (silicon, silicon nitride, boron nitride) and different biomolecule types. The activated vapour silanisation method uses organometallic compounds that can be deposited on any of these materials and activated to form the same functional groups, enabling the system to adapt to different materials and applications without requiring material-specific procedures

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent introduces organometallic compounds as intermediaries that facilitate the functionalization process. These compounds serve as mediators between the vapour deposition system and the tip surface, enabling uniform functional group formation across different materials. The intermediaries decompose during activation to leave behind the desired functional groups, simplifying the manufacturing process while maintaining broad compatibility

Inventive Principle:
Principle #24Intermediary (Mediator)

3Quantity of substance

If a thin film is deposited on AFM tips, then functional groups are generated for specific binding, but the film thickness must be precisely controlled

Engineering Contradiction:
Improvedensity of functional groupsVSAvoidfilm thickness control
Core Design Contradiction:
Quantity of substanceVSManufacturing precision

Solution Approach 1:

The patent controls film thickness through parameter changes in the vapour deposition process, specifically adjusting deposition time, vapour flux, and activation temperature. By optimizing these parameters, the method achieves the desired functional group density (50 nm to 1 µm thickness) while maintaining manufacturing precision. The activated vapour silanisation process inherently provides uniform coverage and controlled thickness through its chemical mechanism

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method enables versatile functionalization of AFM tips with a thin film of 50 nm to 1 µm thickness, enhancing interaction capabilities and measurement range, with a high density of functional groups for specific binding, suitable for various biomolecules and environments.

Implementation Method 1

evaporating an organometallic compound containing at least one silicon atom and at least one functional group

Methodology Applied
Scientific EffectEvaporation: Evaporation

Implementation Method 2

activating the vapour of the organometallic compound by heating to a temperature between 400 and 1000 °C

Methodology Applied
Scientific EffectThermal decomposition: Pyrolysis

Implementation Method 3

causing the activated vapour to impinge on a sensor tip to deposit the organometallic compound

Methodology Applied
Scientific EffectChemical vapour deposition: Chemical Vapour Deposition

Data Source

PatentEP3832318B1Method for obtaining functionalised sensor tips for atomic force microscopy by means of activated vapour silanisation and tips obtained using said method
Publication Date: 2025.11.05 UNIV MADRID POLITECNICA
  • EP3832318B1 patent drawingFigure 1(A)~1(C)
  • EP3832318B1 patent drawingFigure 2
  • EP3832318B1 patent drawingFigure 3

AI summary

The invention relates to a method for obtaining a functionalised sensor tip for atomic force microscopy, which is characterised in that functionalisation takes place by means of an activated vapour silanisation process, comprising: a) evaporating an organometallic compound containing at least one silicon atom and at least one functional group selected from an amine group, a hydroxyl group, a carboxyl group and a thiol group; b) activating the vapour of the organometallic compound of step a) by heating; and c) causing the activated vapour of step b) to impinge on a sensor tip for atomic force microscopy in order to deposit a film of the organometallic compound on the sensor tip, steps b) and c) taking place consecutively. The invention also relates to the functionalised sensor tip obtained using the method.